Absolute longitudinal distance measurement verification of a standard polystyrene nanoparticle near a surface in water by means of multi-wavelength evanescent field Reviewed

Blattler A., Khajornrungruang P., Suzuki K., Baba A., Goto D.

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022   385 - 388   2022.01

Study on On-Machine Visualization of Surface Processing Phenomena in Nanoscale

Blattler Aran, Khajornrungruang Panart, Suzuki Keisuke, Baba Akiyoshi

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering )   2021A ( 0 )   588 - 589   2021.09

Study on Nanoscale Observatory in Polishing Phenomena applying Optical Evanescent Field

Permpatdechakul Thitipat, Khajornrungruang Panart, Suzuki Keisuke, Baba Akiyoshi

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering )   2021A ( 0 )   102 - 103   2021.09

The Benefits of Using SiN as a Buried Oxide in Germanium-On-Insulator Substrate Reviewed International journal

Sethavut Duangchan, Hiroshi Nakashima, Keisuke Yamamoto, Dong Wang

4th IEEE Electron Devices Technology and Manufacturing Conference (EDTM2020)   2020.03

SiN used as a stressor in Germanium-On-Insulator substrate Reviewed International journal

Sethavut Duangchan, Hiroshi Nakashima, Keisuke Yamamoto, Dong Wang

2019 International 3D Systems Integration Conference (3DIC)   2019.10

SiN used as a Stressor in Germanium-On-Insulator Substrate Reviewed International journal

Duangchan S., Yamamoto K., Wang D., Nakashima H., Baba A.

IEEE 2019 International 3D Systems Integration Conference, 3DIC 2019   2019.10

Modulation transfer function analysis of silicon X-ray sensor with trench-structured photodiodes Reviewed

Ariyoshi Tetsuya, Iwasa Jumpei, Takane Yuta, Sakamoto Kenji, Baba Akiyoshi, Arima Yutaka

IEICE Electron. Express   15 ( 11 )   20180177 - 20180177   2018.06

Fabrication of silicon-on-diamond substrate with an ultrathin SiO<inf>2</inf>bonding layer Reviewed

Nagata M., Shirahama R., Duangchan S., Baba A.

Japanese Journal of Applied Physics   57 ( 6 )   2018.06

Silicon trench photodiodes on a wafer for efficient X-ray-to-current signal conversion using side-X-ray-irradiation mode Reviewed

57 ( 4 )   2018.04

Fabrication of Silicon on Diamond Structure with an Ultra-Thin SiO2 Bonding Layer by Sputter Etching Method Reviewed

8D-6-1   2017.11

Estimation of the Conversion Properties of Trench-Structured Silicon X-ray Photodiodes by the Side X-ray Irradiation Method Reviewed

Tetsuya Ariyoshi, Yuta Takane, Jumpei Iwasa, Kenji Sakamoto, Akiyoshi Baba, Yutaka Arima

321 - 322   2017.09

X-ray-to-current signal conversion characteristics of trench-structured photodiodes for direct-conversion-type silicon X-ray sensor Reviewed

56 ( 4 )   2017.04

High-performance vertical Si PiN diode by hole remaining mechanism Reviewed

129   22 - 28   2017.03

Reduced operating temperature of active layer Si covered by nanocrystalline diamond film Reviewed

28 ( 1 )   617 - 624   2017.01

Sensitivity Properties of a Direct Conversion Silicon X-ray Sensor with Trench-Structured Photodiodes Reviewed

141 - 142   2016.09

Novel 600 v low reverse recovery loss vertical PiN diode with hole pockets by Bosch deep trench Reviewed

2016-July   295 - 298   2016.07

The Influence of Plasma Conditions on Surface-Activation that Affect the Bonded Area Reviewed

283 - 284   2016.06

Novel 600 V Low Reverse Recovery Loss Vertical PiN Diode with Hole Pockets by Bosch Deep Trench Reviewed

295 - 298   2016.06

The heat performance study of nanocrystal diamond film used in a thin film device Reviewed

2015.09

Design of a MEMS device for scanning profile measurement with three cantilever displacement sensors Reviewed

2015.09

Influential factors in low-temperature direct bonding of silicon dioxide Reviewed

2015.08

The silicon on diamond structure by low-temperature bonding technique Reviewed

2015.05

Hierarchal decomposition for the structure-fluid-electrostatic interaction in a microelectromechanical system Reviewed

108 ( 6 )   429 - 452   2015.01

Finite element analysis using a hierarchal decomposition for the interaction of structure, fluid and electrostatic field in mems Reviewed

1023 - 1028   2015.01

The effect of surface roughness in SiO2/SiO2 low-temperature bonding Reviewed

B-1-3   2014.12

Finite Element Analysis Using Hierarchal Decomposition for Interaction of Structural, Fluidic and Electrostatic Fields in MEMS Structural Components Reviewed

Daisuke ISHIHARA, Tomoyoshi HORIE, Tomoya NIHO, Akiyoshi BABA

79 ( 804 )   1291 - 1302   2013.08

Side-Illuminated Color photo Sensor Reviewed

( 52 )   04CE10   2013.03

2513 Finite element analysis for interaction for structural : fluidic and electrostatic fields in MEMS structural components

SHUKUWA Yusuke, ISHIHARA Daisuke, HORIE Tomoyoshi, NIHO Tomoya

The Proceedings of The Computational Mechanics Conference ( The Japan Society of Mechanical Engineers )   2013 ( 0 )   _2513 - 1_-_2513-2_   2013.01

High Efficiency Near-Infrared Detection using Deep-Trench Photo-Diode Invited Reviewed

25th International Microprocesses and Nanotechnology Conference   1-p-7-101   2012.10

Fabrication of a polylactide micro-needle array using transfer mold technique for transdermal drug delivery Invited Reviewed

1-P-7-94   2012.10

Side-Illuminated Color photo Sensor Reviewed

International Conference on Solid State Devices and Materials   144 - 145   2012.09

Finite element analysis for interaction problems of structure, fluid and electrostatic field in micro cantilever beams Invited Reviewed

255 - 260   2012.09

Improved Near-Infrared Sensitivity with a Side-Illuminated Photosensor Reviewed

Tetsuya Ariyoshi, Noriyuki Uryu, Akiyoshi Baba, Yutaka Arima

Jpnese Journal of Applied Physics   51   02BE01   2012.02

Fabrication of pn junction at the wall of deep trench for near-infrared sensor Reviewed

Akiyoshi Baba, Noriyuki Uryu, Senichi Sumi

24th International Microprocesses and Nanotechnology Conference   2011.10

Improved Near-Infrared Sensitivity for a Side-Illuminated Photo Sensor Reviewed

Tetsuya Ariyoshi, Noriyuki Uryu, Akiyoshi Baba, Yutaka Arima

2011 Int'l Conference on Solid State Devices and Materials   1031 - 1032   2011.09

Development of Orderly Micro Asperity on Polishing Pad Surface for Chemical Mechanical Polishing (CMP) Process using Anisotropic Etching Reviewed

Khajornrungruang P., Kimura K., Baba A., Yasuda K., Tanaka A

Proceedings of GCMM2010   2010.06

Development of Periodically Arrayed Micro Pyramid Asperity on Polishing Pad Surface for CMP Process Using Lithography Reviewed

Keiichi Kimura, Akiyoshi Baba, Naoaki Takahashi, Yuichi Hashiyama, Keisuke Yasuda

3rd International Conference of Asian Society for Precision Engineering and Nanotechnology   2009.11

Fabrication of microneedle array for transdermal drug delivery Reviewed

Yuu Shigetome, Yu Taniguchi, Takahiro Ito, Akiyoshi Baba, Tomohiro Hikima, Kakuji Tojo

3rd International Conference of Asian Society for Precision Engineering and Nanotechnology   2009.11

Simple fabrication of gated field electron emitter using vertical thin film induced by ion beam irradiation Reviewed

T. Yoshida,M. Nagao,A. Baba,T. Asano,S. Kanemaru

J. Vac. Sci. Technol. B   27 ( 2 )   729 - 734   2009.02

Improved near-infrared sensitivity of a back-side illuminated image sensor with a metal reflector Reviewed

Tetsuya Ariyoshi,Shozo Morita,Akiyoshi Baba,Yutaka Arima

IEICE Electron. Express   6 ( 6 )   341 - 346   2009.02

Simple fabrication of gated field electron emitter using vertical thin film induced by ion beam irradiation Reviewed

T. Yoshida,M. Nagao,A. Baba,T. Asano,S. Kanemaru

21th International Vacuum Nanoelectronics Conference   32 - 33   2008.07

Fabrication of Vertical Thin Film FEA Using Ion-Induced Bending Technique Reviewed

Tomoya Yoshida,Chiaki Yasumuro,Masayoshi Nagao,Seigo Kanemaru,Akiyoshi Baba,and Tanemasa Asano

Proceedings of The 14th International Display Workshops   3   2209 - 2212   2007.12

Statistical Investigation on the Design of Field Emitter Array Reviewed

Tomoya Yoshida,Akiyoshi Baba,Tanemasa Asano

19th International Vacuum Nanoelectronics Conference & 50th International Field Emission Symposium   43 - 44   2006.07

Fabrication of a Gated Cold Cathode by Using the Inkjet Embedding method Reviewed

Akiyoshi Baba,Tanemasa Asano

Jpn. J. Appl. Phys   45 ( 6B )   5631 - 5636   2006.04

Properties of Ink-Droplet Formation in Double-Gate Electrospray Reviewed

Yuji Ishida,Keigo Sogabe,Kazunori Hakiai,Akiyoshi Baba,Tanemasa Asano

Jpn. J. Appl. Phys.   45 ( 8A )   6475 - 6480   2006.04

Fabrication of gated cold cathode using standing thin film induced by ion-beam bombardment Reviewed

Tomoya Yoshida,Akiyoshi Baba,Tanemasa Asano

J. Vac. Sci. Technol. B   24 ( 2 )   932 - 935   2006.04

Fabrication of a Gated Cold Cathode by Using the Inkjet Embedding Method Reviewed

Akiyoshi Baba,Tanemasa Asano

2005 International Microprocesses and Nanotechnology Conference   278 - 279   2005.10

Gate Controlled Electrostatic Droplet Ejection Reviewed

Yuji Ishida,Keigo Sogabe,Kazunori Hakiai,Akiyoshi Baba,Tanemasa Asano

2005 International Microprocesses and Nanotechnology Conference   280 - 281   2005.10

Fabrication of Gated cold cathode Using Standing Thin Film Induced by Ion-Beam Bombardment Reviewed

Tomoya Yoshida,Akiyoshi Baba,Tanemasa Asano

18th International Vacuum Nanoelectronics Conference   38 - 39   2005.07

Fabrication of Gated Carbon Black Field Electron Emitter Using Inkjet Printing Reviewed

Akiyoshi Baba,Yuji Ishida,Kazunori Hakiai,Tanemasa Asano

18th International Vacuum Nanoelectronics Conference   42 - 43   2005.07

Fabrication of Micro Field Emitter Tip Using Ion-Beam Irradiation-Induced Self-Standing of Thin Films Reviewed

Tomoya Yoshida,Akiyoshi Baba,Tanemasa Asano

Jpn. J. Appl. Phys   44 ( 7B )   5744 - 5748   2005.04

Electrostatic Droplet Ejection Using Planar Needle Inkjet Head Reviewed

Kazunori Hakiai,Yuji Ishida,Akiyoshi Baba,Tanemasa Asano

Jpn. J. Appl. Phys.   44 ( 7B )   5781 - 5785   2005.04

Electrostatic Inkjet Patterning Using Si Needle Prepared by Anodization Reviewed

Yuji Ishida,Kazunori Hakiai,Akiyoshi Baba,Tanemasa Asano

Jpn. J. Appl. Phys.   44 ( 7B )   5786 - 5790   2005.04

Fabrication of Micro Field Emitter Tip Using Ion-Beam Irradiation-Induced Self-Standing of Thin Film Reviewed

Tomoya Yoshida,Akiyoshi Baba,Tanemasa Asano

2004 International Microprocesses and Nanotechnology Conference   328 - 329   2004.10

Electrostatic Inkjet Patterning Using Si Needle Prepared by Anodization Reviewed

Yuji Ishida,Kazunori Hakiai,Kazunari Matsuzaki,Akiyoshi Baba,Tanemasa Asano

2004 International Microprocesses and Nanotechnology Conference   28 - 29   2004.10

Measurement of Electron Energy Distribution Obtained from Wedge Type Silicon Emitter Array Reviewed

Katsuya Higa,Akiyoshi Baba,Tanemasa Asano

2004 International Microprocesses and Nanotechnology Conference   258 - 259   2004.10

Electrostatic Droplet Ejection Using Planar Needle Inkjet Head Reviewed

Kazunori Hakiai,Yuji Ishida,Kazunari Matsuzaki,Akiyoshi Baba,Tanemasa Asano

2004 International Microprocesses and Nanotechnology Conference   30 - 31   2004.10

Reduction of the Gate-Oxide/poly-Si Interface Roughness by Microwave-Plasma Oxidation and Its Impact on TFT Performance Reviewed

Chihiro Shin,Akiyoshi Baba,Tanemasa Asano

2004 Int. Workshops on Active-Matrix Liquid-Crystal Displays   317 - 320   2004.08

Ultra-High Electron Emission Efficiency from Defect Control Polyimide Tunnel Cathode Reviewed

Akiyoshi Baba,Tomoya Yoshida,Tanemasa Asano

17th International Vacuum Nanoelectronics Conference   104 - 105   2004.07

Feasibility of Inkjet Printing for Field Electron Emitter Fabrication Reviewed

Akiyoshi Baba,Yuji Ishida,Tomoya Yoshida,Kazunori Hakiai,Kazunari Matsuzaki,Tanemasa Asano

17th International Vacuum Nanoelectronics Conference   272 - 273   2004.07

Increase in Emission Current after High-Frequency Low-Voltage Pulses Application Observed for Gated Nano-Pillar Cathode Reviewed

Tomoya Yoshida,Akiyoshi Baba,Tanemasa Asano

17th International Vacuum Nanoelectronics Conference   258 - 259   2004.07

Field Emission Characteristics of Defect-Controlled Polyimide Tunneling Cathode Reviewed

Akiyoshi Baba,Tomoya Yoshida,Tanemasa Asano

J. Vac. Sci. & Technol. B   22 ( 3 )   1353 - 1357   2004.04

Field Electron Emission Inkjet-Printed Carbon Black Reviewed

Akiyoshi Baba,Tomoya Yoshida,Kazunari Matsuzaki,Yuji Ishida,Tanemasa Asano

Jpn. J. Appl. Phys.   43 ( 6B )   3923 - 3927   2004.04

Increased Emission Efficiency of Gated Cold Cathode with Carbonic Nano-Pillars Reviewed

Tomoya Yoshida,Akiyoshi Baba,Tanemasa Asano

Jpn. J. Appl. Phys.   43 ( 6B )   3901 - 3905   2004.04

Gated Cold Cathode Array with Carbonic Nano-Pillars Formed by O2 RIE for FED Application Reviewed

Tomoya Yoshida,Akiyoshi Baba,Tanemasa Asano

10th Int. Display Workshops   1231 - 1234   2003.12

Gate Oxide Integrity of Microwave-Plasma-Grown Silicon Oxide Reviewed

Akiyoshi Baba,Chihiro Shin,Tanemasa Asano

10th Int. Display Workshops   439 - 442   2003.12

Planer Electrostatic Inkjet Device with Gate Electrode Reviewed

Kazunari Matsuzaki,Yuji Ishida,Atsunobu Yoshida,Akiyoshi Baba,Tanemasa Asano

2003 International Microprocesses and Nanotechnology Conference   190 - 191   2003.10

Field Electron Emission from Carbon Black Prepared by Inkjet Printing Reviewed

Akiyoshi Baba,Tomoya Yoshida,Kazunari Matsuzaki,Yuji Ishida,Tanemasa Asano

2003 International Microprocesses and Nanotechnology Conference   300 - 301   2003.10

Increased Emission Efficiency of Gated Cold Cathode with Carbonic Nano-Pillars Reviewed

Tomoya Yoshida,Akiyoshi Baba,Tanemasa Asano

2003 International Microprocesses and Nanotechnology Conference   188 - 189   2003.10

Electrostatic Inkjet Head Fabricated by Anodization of Si Reviewed

Yuji Ishida,Kazunari Matsuzaki,Akiyoshi Baba,Tanemasa Asano

2003 International Microprocesses and Nanotechnology Conference   302 - 303   2003.10

Self-Aligned Fabrication of Gated Organic Nano-Pillar Cold Cathode Reviewed

Akiyoshi Baba,Tomoya Yoshida,Tanemasa Asano

16th International Vacuum Microelectronics Conference   17 - 18   2003.07

Field Emission Characteristics of Defect-Controlled Polyimide Tunneling Cathode Reviewed

Akiyoshi Baba,Tomoya Yoshida,Tanemasa Asano

16th International Vacuum Microelectronics Conference   267 - 268   2003.07

Micro Field Emitter with Nano-Pillarets Formed by RIE of Photoresist Reviewed

Akiyoshi Baba,Tomoya Yoshida,Tanemasa Asano

Jpn. J. Appl. Phys   42 ( 6B )   552 - 556   2003.04

インクジェット法で作製したカーボンブラックからの電界電子放出

馬場昭好,吉田知也,石田雄二,浅野種正

信学技報 Technical Report of IEICE   37 - 42   2003.04

Field Emission from Metal Particles Bound with a Photoresist Reviewed

Akiyoshi Baba,Tanemasa Asano

J. Vac. Sci. & Technol. B   21 ( 1 )   552 - 556   2003.01

MIM Cold Cathode Using Ion-Beam Irradiated Polyimide as Tunneling Insulator Reviewed

Akiyoshi BABA,Tomoya YOSHIDA,Tanemasa ASANO

9th Int. Display Workshops   1049 - 1052   2002.12

Micro Field Emitter with Nano-Pillarets Formed by RIE of Photoresist Reviewed

Akiyoshi BABA,Tomoya YOSHIDA,Tanemasa ASANO

2002 International Microprocesses and Nanotechnology Conference   332 - 333   2002.11

Field Electron Emission from Gated Organic Emitter Tips Prepared Using Stamping Technique Reviewed

Akiyoshi BABA,Kouichi TSUBAKI,Tanemasa ASANO

15th International Vacuum Microelectronics Conference & 48th International Field Emission Symposium   2002.07

Easy Release of the Mold in an Imprinting Method Using Ion Beam Modification of Photoresist Surface Reviewed

Akiyoshi Baba,Masakazu Iwamoto,Kouichi Tsubaki,Tanemasa Asano

Jpn. J. Appl. Phys.   41 ( 6B )   4190 - 4193   2002.06

RIEにより作製した有機物針状突起群を電子源とする三極素子の作製

吉田知也,馬場昭好,浅野種正

信学技報 Technical Report of IEICE   23 - 28   2002.04

Easy Removal of Mold for Imprint Lithography by Ion Beam Modification of Photoresist Surface Reviewed

Akiyoshi BABA,Masakazu IWAMOTO,Kouichi TSUBAKI,Tanemasa ASANO

2001 International Microprocesses and Nanotechnology Conference   96 - 97   2001.11

Field Emission from Nano-Protrusion Fabricated Using Nano-Stamp Technique Reviewed

Akiyoshi BABA,Kouichi TSUBAKI,Tanemasa ASANO

2001 International Microprocesses and Nanotechnology Conference   196 - 197   2001.11

Field Emission from Nano-Pillarets Prepared by Reactive Ion Etching of Organic Materials Reviewed

Akiyoshi BABA,Tanemasa ASANO

21st Int. Display Research Conference in conjunction with the 8th Int. Display Workshops   1185 - 1188   2001.10

Field Emission from Metal-Particle Bound with a Photoresist Reviewed

Akiyoshi BABA,Tanemasa ASANO

14th International Vacuum Microelectronics Conference   235 - 236   2001.08

有機材料のスタンプ形成による高密度電子源ティップアレイの作製

椿弘一,馬場昭好,浅野種正

信学技報 Technical Report of IEICE   21 - 26   2001.04

Field Emission from Pd Fine-Particle Film Reviewed

Akiyoshi BABA,Tanemasa ASANO

The Seventh International Display Workshops IDW '00   979 - 982   2000.12

Fabrication of Gated Field Emitter from Wedge Array Prepared by Stamp Technology Reviewed

Akiyoshi BABA,Kouichi TSUBAKI,Masakazu IWAMOTO,Tanemasa ASANO

2000 International Microprocesses and Nanotechnology Conference   128 - 129   2000.07

Imprint Lithography Using Triple-Layer-Resist and its Application to MOSFET Fabrication Reviewed

Hiroyuki NAKAMURA,Akiyoshi BABA,Tanemasa ASANO

2000 International Microprocesses and Nanotechnology Conference   232 - 233   2000.07

Imprint lithography Using Triple-Layer-Resist and Its Application to Metal-Oxide-Silicon Field-Effect-Transistor Fabrication Reviewed

Hiroyuki Nakamura,Akiyoshi Baba,Tanemasa Asano

Japanese Journal of Applied Physics Part 1   39 ( 12B )   7080 - 7080   2000.04

Stamp Technology for Fabrication of Field Emitter from Organic Material Reviewed

Akiyoshi Baba,Masafumi Hizukuri,Masakazu Iwamoto,Tanemasa Asano

Journal of Vacuum Science and Technology B   18 ( 2 )   877 - 879   2000.04

絶縁体でバインドされたパラジウム微粒子膜からの電界電子放出

馬場昭好,浅野種正

信学技報 Technical Report of IEICE   25 - 30   2000.04

Fabrication of Field Emitters from Organic Materials Using a Stamp Technology Reviewed

Akiyoshi Baba,Masafumi Hizukuri,Masakazu Iwamoto,Tanemasa Asano

The Sixth International Display Workshops   919 - 922   1999.12

Fabrication of Carbon-Based Field Emitters Using a Stamp Technology Reviewed

Akiyoshi Baba,Masafumi Hizukuri,Masakazu Iwamoto,Tanemasa Asano

1999 International Microprocesses and Nanotechnology Conference   182 - 183   1999.07

Field emission from an ion-beam modified polyimide film Reviewed

Akiyoshi Baba,Katsuya Higa,Tanemasa Asano

Japanese Journal of Applied Physics   38 ( 3A )   L261 - L263   1999.04

Fabrication of Carbon-Based Field Emitters Using stamp Technology Reviewed

Akiyoshi Baba,Masafumi Hizukuri,Masakazu Iwamoto,Tanemasa Asano

Japanese Journal of Applied Physics   38 ( 12B )   7203 - 7207   1999.04

塗布性有機膜のイオン照射改質による炭素系電子源材料 Reviewed

浅野種正,馬場昭好

ディスプレイ アンド イメージング   1 ( 8 )   61 - 68   1999.04

Field Emission from an Ion-Beam Modified Polyimide Film Reviewed

Akiyoshi Baba,Katsuya Higa,Tanemasa Asano

Japanese Journal of Applied Physics   38 ( 3A )   L261 - L263   1999.04

スタンプ法による有機材料の構造形成と電界放出型微小電子源への応用

馬場昭好,岩本正和,浅野種正

信学技報 Technical Report of IEICE   25 - 30   1999.04

A flexible field emitter made by ion-beam modification of polyimide film: Reviewed

Akiyoshi Baba,Katsuya Higa,Tanemasa Asano

The Fifth International Display Workshops   61 - 64   1998.12

有機物イオン照射改質によるマイクロコールドエミッタ材料の創製

浅野種正,馬場昭好,比嘉勝也

信学技報　Technical Report of IEICE   29 - 36   1998.04

Deep Level of Iron-Hydrogen Complex in Silicon Reviewed

Taizoh Sadoh,K. Tsukamoto,A. Baba,D. Bai,A. Kenjo,T. Tsurushima

J. Appl. Phys.   82   3828 - 3828   1997.04

Deep States in Silicon on Sapphire by Transient-Current Spectroscopy Reviewed

T. Sadoh,A. Matsushita,Y.-Q. Zhang,D.-J. Bai,A. Baba,A. Kenjo,T. Tsurushima

J. Appl. Phys.   82   5262 - 5262   1997.04

Growth Kinetics of CoSi Formed by Ion Beam Irradiation at Room Temperature Reviewed

Jounal of Applied Physics   ( 82 )   5480 - 5480   1997.04

Behavior of Radiation-Induced Defects and Amorphization in Silicon Crystal Reviewed

Nuclear Instrument & Methods in Physics Research B   ( 121 )   299 - 299   1997.04

Effect of Energy Transport with Recoil Atoms on Deposited Energy Distribution in Silicon Irradiated with Energetic Ions

Dong-Ju Bai,Akiyoshi Baba,Atsushi Kenjo,Taizoh Sadoh,Hiroshi Nakashima,Hiroshi Mori,Toshio Tsurushima

Research Reports on Information Science and Electrical Engineering of Kyushu University   1997.04

Simplified Evaluation of Displacement Effect Distribution in Silicon Irradiated with Low-Energy Ions

Dong-Ju Bai,Tomohiro Kawase,Akiyoshi Baba,Atsushi Kenjo,Taizoh Sadoh,Hiroshi Nakashima,Hiroshi Mori,Toshio Tsurushima

Research Reports on Information Science and Electrical Engineering of Kyushu University   2   59 - 59   1997.04

低エネルギーイオン照射によるシリコンの非晶質化

白冬菊,河瀬智宏,馬場昭好,権丈淳,佐道泰造,中島寛,森紘,鶴島稔夫

九州大学大学院システム情報科学研究科報告   2 ( 1 )   1997.04

イオンビーム照射によるコバルトシリサイド形成機構

馬場昭好,荒牧宏隆,阿部孝幸,松下篤志,佐道泰造,権丈淳,森紘,中島寛,鶴島稔夫

九州大学中央分析センター報告   ( 15 )   1997.04

Evaluation of Damage Induced by Low-Energy Ion Irradiation in Silicon

Akiyoshi Baba,Taizoh Sadoh,Atsushi Kenjo,Hiroshi Nakashima,Hiroshi Mori,Toshio Tsurushima

Memoirs of the Faculty of Engineering Kyushu University   55   127 - 127   1995.04

Behavior of Defects Induced by Low-Energy Ions in Silicon Films Reviewed

Taizoh Sadoh,Hironori Takeshita,Akiyoshi Baba,Atsushi Kenjo,Hiroshi Nakashima,Toshio Tsurushima

Jpn. J. Appl. Phys.   33   7151 - 7151   1994.04

表面活性化接合における接合面積拡大のためのイオン条件の検討

白浜 亮弥,Duangchan Sethavut,村山 智紀,濱田 爽志,馬場 昭好

第8回集積化MEMSシンポジウム 

生分解性マイクロニードルアレイの作製

情報システム専攻

2009年応用物理学会九州支部学術講演会 

深溝構造を持つ結晶シリコン太陽電池の作製

情報システム専攻

2009年応用物理学会九州支部学術講演会 

静電アクチュエーターを有する静電インクジェットノズルの作製

情報システム専攻

2009年応用物理学会九州支部学術講演会 

高耐圧素子における終端構造の作製

情報システム

第62回電気関係学会九州支部連合大会 

マイクロ片持ちはりの振動における構造-流体-静電界連成効果に関する研究

情報システム

機械学会九州支部第62期講演会 

深溝構造を持つシリコン太陽電池の提案

情報システム専攻・電子情報工学分野

平成21年電気学会全国大会 

可動針を有する静電インクジェットノズルの提案

情報システム

平成21年電気学会全国大会 

MEMS技術を応用したCMP用マイクロパターンパッドの研究（第2報）

情報システム専攻・機械情報工学分野

2009年度精密工学会春季大会学術講演会 

裏面深堀によるpn接合型シリコン近赤外線受光素子の高感度化

情報システム専攻・電子情報工学分野

第61回電気関係学会九州支部連合大会 

フェムトリットル液滴吐出可能な静電針型インクジェットノズルの一体形成

情報システム・電子情報工学分野

第61回電気関係学会九州支部連合大会 

MEMS技術を応用したCMP用マイクロパターンパッドの研究（第1報）-微小ピラミッド型パターンパッドの製作法-

情報システム専攻・機械情報工学分野

2008年度精密工学会秋季大会学術講演会 

イオン照射薄膜直立現象を利用して作製したVTF(Vertical Thin Film)電子源の先鋭化法の検討

産総研吉田知也

第68回応用物理学会学術講演会 

インクジェット法を用いたカーボンナノチューブ電子源の作製

第54回応用物理学関係連合講演会 

イオン照射による薄膜の変形現象を利用して作製した電界放出型電子源

電子情報通信学会技術研究報告（電子デバイス研究会） 

Niインプリント法による非晶質SiGe薄膜の固相成長促進

第53回応用物理学関係連合講演会 

電子源設計に関する統計的考察

第53回応用物理学関係連合講演会 

ゲート電極付き静電型インクジェットノズルによる液滴吐出

第53回応用物理学関係連合講演会 

イオン照射による薄膜の変形現象を利用して作製したゲート付き電子源の電子放出特性

第66回応用物理学会学術講演会 

シリコン針形エミッタアレイからの放出電子エネルギー測定とその計測計の検討

第66回応用物理学会学術講演会 

Niインプリント法による非晶質SiGe薄膜/絶縁体の種付け固相成長

第66回応用物理学会学術講演会 

インクジェット法により作製したゲート電極付きカーボンブラック電子源からの電子放出特性

本人

第66回応用物理学会学術講演会 

インクジェット法によるカーボンブラック含有インクのゲート穴への埋め込み

本人

第52回応用物理学関係連合講演会 

イオン照射による薄膜の変形現象を用いた微小電子源の作製

第52回応用物理学関係連合講演会 

方形波電圧による静電インクジェット描画

第52回応用物理学関係連合講演会 

静電インクジェットにおける液滴吐出検出

第52回応用物理学関係連合講演会 

FED応用を目指した静電吐出型インクジェット・ノズルの研究

マイクロ化総合技術センター　浅野種正

カーボンナノチューブ-FED プロジェクト公開シンポジウム・第3回真空ナノエレクトロニクスシンポジウム 

インクジェット法による高精度配列電子源アレイの作製

本人

電子情報通信学会技術研究報告会（電子デバイス研究会） 

静電型針状Siインクジェットヘッドによる描画

第65回応用物理学会学術講演会 

部分的表面自由エネルギー変化による吐出液滴の精細パターニングの可能性

本人

第65回応用物理学会学術講演会 

有機物ナノピラーを電子源とする三極素子の破壊機構の調査

第65回応用物理学会学術講演会 

インクジェット法による電界電子放出源の作製

本人

第51回応用物理学関係連合講演会 

陽極化成法で作製した針状Siインクジェットヘッドからの液滴静電吐出

第51回応用物理学関係連合講演会 

マイクロ波励起プラズマ酸化によるpoly-Si/酸化膜界面ラフネスの低減

第51回応用物理学関係連合講演会 

高周波低電圧パルス印加によるナノピラー電子源からの放出電流の増加

第51回応用物理学関係連合講演会 

低電圧パルス印加法による欠陥導入ポリイミドMIM型冷陰極のフォーミング

本人

第51回応用物理学関係連合講演会 

ウェッジ形Siエミッタアレイからの電界放出電子のエネルギー測定の検討

第51回応用物理学関係連合講演会 

インクジェット法で作製したカーボンブラックからの電界電子放出

本人

電子情報通信学会技術研究会電子デバイス研究会 

マイクロ波プラズマで成長したSi酸化膜のゲート酸化膜への適合性

第29回応用物理学会九州支部学術講演会 

有機材料より形成した炭素系針状突起群を持つ三極電子源のリーク電流の低減

第64回応用物理学会学術講演会 

一次元配置した針つきノズルからの静電誘引液体吐出

第64回応用物理学会学術講演会 

改質ポリイミドトンネル冷陰極からの放出電子エネルギー分布

本人

第64回応用物理学会学術講演会 

自己整合プロセスで作製した有機物針状突起群を電子源とする三極素子の作製

第50回応用物理学関係連合講演会 

欠陥導入ポリイミドトンネル冷陰極の電子放射特性

第50回応用物理学関係連合講演会 

Si表面に作製した一次元配置ノズルからの液体静電吐出

第50回応用物理学関係連合講演会 

RIEにより作製した有機物針状突起群を電子源とする三極素子の作製

電子情報通信学会 電子デバイス研究会 

イオンビーム改質したポリイミドをトンネル絶縁層とするMIM型電子源の作製

第63回応用物理学会学術講演会 

有機物ナノティップ電子源アレイの三極構造化

応用物理学関係連合講演会 

有機材料のスタンプ成形による高密度電子源ティップアレイの作製

電子情報通信学会技術研究会（電子デバイス研究会） 

金属微粒子混入フォトレジスト膜の電子放出特性の改善

応用物理学会学術講演会 

改質有機電子源チップの微細化による電子放出特性の改善

応用物理学会学術講演会 

酸素プラズマ処理した有機材料からの電界電子放出

応用物理学会学術講演会 

スタンプ法で作製した改質有機電子源の三極構造化

第48回応用物理学関係連合講演会 講演予稿集 

絶縁体でバインドされた金属微粒子からの電界電子放出

第48回応用物理学関係連合講演会 講演予稿集 

絶縁体でバインドされたパラジウム微粒子膜からの電界電子放出

電子情報通信学会技術研究報告（電子デバイス研究会） 

スタンプ法で作製した改質有機微小電子源の三極構造化

平成12年度応用物理学会九州支部講演会講演予稿集 

Pd微粒子膜からの電界電子放出

第61回応用物理学会学術講演会 

ビーム改質有機エミッタの初期有機材料による電子放出特性の違い

第61回応用物理学会学術講演会 

イオンビーム改質および熱改質ポリイミド膜の電気伝導特性

第47回応用物理学関係連合講演会 

スタンプ法による有機材料の構造形成と電界放出型微小電子源への応用

電子情報通信学会電子デバイス研究会 

スタンプ法による微小電子源の作製

応用物理学会九州支部講演会 

イオンビーム改質したポリイミド膜の電気伝導特性

第60回応用物理学会学術講演会 

スタンプ法によるフィールドエミッターの作製

本人

第46回応用物理学関係連合講演会 

スタンプ法によるポイント型フィールドエミッタアレイの作製

第47回応用物理学関係連合講演会 

イオンビーム改質したポリイミドフィルムからの電界放出

本人

第59回応用物理学会学術講演会 

産学連携製造中核人材育成セミナー（遠隔型）

Role(s)：Presenter,　Chief editor,　Lecturer,　Planner,　Organizing member,　Demonstrator

2021.07.27 - 2021.07.30