KHAJORNRUNGRUANG Panart

写真a

Title

Associate Professor

Laboratory

680-4 Kawazu, Iizuka-shi, Fukuoka

Research Fields, Keywords

Optical Applied Measurement, Visualization in Nanoscale, Chemical Mechanical Polishing

Fax

+81-948-29-7751

Scopus Paper Info  
Total Paper Count: 0  Total Citation Count: 0  h-index: 6

Citation count denotes the number of citations in papers published for a particular year.

Undergraduate Education 【 display / non-display

  • 2000.03   Osaka University   Faculty of Engineering   Department of Mechanical Engineering   Graduated   JAPAN

Post Graduate Education 【 display / non-display

  • 2002.03  Osaka University  Graduate School, Division of Engineering  Master's Course  Completed  JAPAN

Degree 【 display / non-display

  • Osaka University -  Doctor of Engineering  2005.03

Biography in Kyutech 【 display / non-display

  • 2019.04
    -
    Now

    Kyushu Institute of TechnologyFaculty of Computer Science and Systems Engineering   Department of Intelligent and Control Systems   Associate Professor  

  • 2016.09
    -
    2019.03

    Kyushu Institute of TechnologyFaculty of Computer Science and Systems Engineering   Department of Mechanical Information Science and Technology   Associate Professor  

  • 2014.11
    -
    2016.08

    Kyushu Institute of TechnologyFaculty of Computer Science and Systems Engineering   Department of Mechanical Information Science and Technology   Assistant Professor  

  • 2007.04
    -
    2014.10

    Kyushu Institute of TechnologyAdvanced Mold and Die Technology Center   Assistant Professor  

  • 2006.04
    -
    2007.03

    Kyushu Institute of TechnologyAdvanced Mold and Die Technology Center   Research Assistant  

display all >>

Biography before Kyutech 【 display / non-display

  • 2013.03
    -
    2014.03

    Clarkson Univerisity (USA)   the Center for Advanced Materials Processing (CAMP)   Specially Appointed Associate Professor   UNITED STATES

Academic Society Memberships 【 display / non-display

  • 2014.04
    -
    2020.03
     

    The Optical Society of Japan  JAPAN

  • 2012.03
    -
    2020.07
     

    euspen  UNITED KINGDOM

  • 2011.04
    -
    Now
     

    Affiliate, JSPE  JAPAN

  • 2008.09
    -
    Now
     

    Planarization and CMP Technical Committee, JSPE  JAPAN

  • 2008.04
    -
    Now
     

    Intelligent Nano-Measure, JSPE  JAPAN

Specialized Field (scientific research fund) 【 display / non-display

  • Optical engineering, Photon science

  • Nano/Microsystems

  • Production engineering/Processing studies

  • Measurement engineering

 

Research Career 【 display / non-display

  • Dynamical Nano-Particle Visualization in Nano-scale Interfacial

    Evanescent Field, Nano-Particle, Interfacial, Visualization, Optics, Laser, Dynamic  

    Project Year: 2008.04  -  Now 

  • Study on Edge Tip Nano-position Measurement by Optical Evanescent Field

    Project Year: 2015.10  -  Now 

  • On-Machine sub-micrometer Measurement of Micro Cutting Tool using Laser Diffraction

    Measurement, Machining, Diffraction, On-Machine, Tool, Applied Optics  

    Project Year: 2005.10  -  2017.03 

  • Chemical Mechanical Polishing

    Semiconductor, Polishing, Nano-Particle  

    Project Year: 2005.04  -  Now 

Publications (Article) 【 display / non-display

  • Light scattering model for individual sub-100-nm particle size determination in an evanescent field

      55 ( 6S3 ) 06JG02-1 - 06JG02-2   2016.06  [Refereed]

    DOI CiNii

  • Observation of the formation of anisotropic silver microstructures by evanescent wave and electron microscopy

    Angshuman Pal, Panart Khajornrungruang, Christopher Netzband, Sriveda Alety, S. V. Babu

    Nanotechnology    27 ( 7 ) 075708 (1) - 075708 (10)   2016.02  [Refereed]

     View Summary

    Using a well-known galvanic displacement reaction, ~25–40 μm long silver ribbons grown after mixing ~50 nm copper particles with AgNO3 solution were observed as a function of Ag+ concentration and their growth was characterized in real-time and in situ by evanescent wave (EW) microscopy. At low Ag+ concentration, chain-like structures consisting of both Ag and Cu were observed. When the sequence of mixing these two reactants was reversed, different Ag microstructures (platelets and dendrites) were formed and were also characterized by EW microscopy. Dependence of the morphology of all these microstructures on silver ion concentration was determined by EW microscopy in conjunction with scanning and transmission electron microscopy.

    repository DOI Scopus

  • Real time imaging of the growth of silver ribbons by evanescent wave microscopy

    Angshuman Pal, Panart Khajornrungruang, S. V. Babu

    RSC Advances    5   71830 - 71834   2015.08  [Refereed]

     View Summary

    Real time visualization of the in situ growth of ∼40 μm long high aspect ratio silver ribbons, synthesized by template-free galvanic displacement using ∼100 nm Cu particles and Ag ions in aqueous conditions, is demonstrated using evanescent wave microscopy. The observed growth rate from several ribbons is 1.5 ± 0.5 μm/s.

    DOI Scopus

  • Spatial Fourier Transform Analysis of Polishing Pad Surface Topography

    Panart Khajornrungruang, Keiichi Kimura, Takahisa Okuzono, Keisuke Suzuki, and Takashi Kushida

    Japanese Journal of Applied Physics    51 ( 5 )   2012.05  [Refereed]

    DOI Scopus CiNii

  • Study on the SUAM Double Magnet System for Polishing

    Nakasaki Tatsuya, Kinoshita Yushi, Khajornrungruang Panart, Otabe Edmund Soji, Suzuki Keisuke

    International Journal of Automation Technology    15 ( 4 ) 503 - 511   2021.01  [Refereed]

     View Summary

    <p>Superconductive assisted machining (SUAM) is a novel machining method that eliminates tool interference via magnetic levitation tools. In our study, we developed a double magnet system (DMS) to increase the maximum power of the holding force and stabilize the magnetic rotation during polishing via the higher magnetic flux compared to a single magnet system (SMS). The maximum magnetic flux density of the DMS was approximately 100 mT higher than that of the SMS. In these cases, the entire holding force increases as the distance between the superconducting bulk and lower magnet decreases. The attractive forces are maximum around a displacement of 6 mm, although the repulsive and restoring forces increase spontaneously. The polishing performances of the DMS on the SUS304 and A1100P plates were evaluated using water-based diamond slurries, for equal levitation amounts. The amount removed by the DMS increased for the A1100P and SUS304 substrates compared to that by the SMS. In this case, we observe that the deviation of the polishing area on the DMS decreases compared to that of the SMS, reflecting a more stable rotation and movement due to the higher holding force.</p>

    DOI CiNii

display all >>

Conference Prsentations (Oral, Poster) 【 display / non-display

  • 層間絶縁膜CMPプロセスにおけるスラリー中の微粒子の挙動観察

    出井良和

    2009年度 日本機械学会九州支部第63期総会・講演会  (熊本大学(黒髪南キャンパス))  2010.03  -  2010.03  日本機械学会

  • Dynamical Observation of Slurry Fine Particle in CMP Process

    Proceedings of JSPE Kyushu Region Conference 2009  2009.12  -  2009.12 

  • Proposal of Optical Measurement Method for 3D Single Nanoparticle Position Near a Surface

    Panart Khajornrungruang

    the 21th International Symposium on Chemical-Mechanical Planarization  2017.08  -  2018.08  Clarkson University and NYSTAR

  • 水酸化フラーレン含有加工液を用いた紫外光照射CMPに関する研究

    李木宣孝

    2009年度精密工学会九州支部地方講演会  2009.12  -  2009.12 

  • Observation role of fine particles in dielectric material CMP applying evanescent field

    Panart Khajornrungruang

    Center for Advanced Materials Processing's Annual Technical Meeting 2013  (Saratoga Springs, New York USA)  2013.05  -  2013.05  Clarkson University, NYSTAR

display all >>

Lectures 【 display / non-display

  • Concept of Spatial Fourier Transform Analysis for Polishing Pad Surface 3D Topography

    the 22st International Symposium on Chemical-Mechanical Planarization ( Lake Placid, NY )  2018.08.15  Clarkson University and Empire State Development Division of Science, Technology and Innovation (NYSTAR)

  • Light Scattering Model for Individual Sub-100-nm Particle Size Determination in an Evanescent Field and its Verification with Compact Apparatus

    the 20st International Symposium on Chemical-Mechanical Planarization ( Lake Placid, NY )  2016.08.10  Clarkson University and Empire State Development Division of Science, Technology and Innovation (NYSTAR)

  • 高速加工 における高速回転小径工具の機上計測

    第323回 講習会「機械加工における計測の基礎と最新動向」   2012.12.04  日本機械学会関西支部

Grants-in-Aid for Scientific Research 【 display / non-display

  • Study on electro plating and etching for metal interconnect in integrated circuit assisted with ArF excimer laser

    Grant-in-Aid for Young Scientists(B)

    Project Year:  2008.04  -  2010.03

    Project Number:  20760086

Career of Research abroad 【 display / non-display

  • Visualization of Sub 100 nm Particles on Interfacial by Evanescent Wave Scattering

    Clarkson University  Project Year:  2013.03.27  -  2014.03.26

 

Activities of Academic societies and Committees 【 display / non-display

  • 2014.04
    -
    2020.03

    The Optical Society of Japan  

  • 2009.04
    -
    2009.12

    Planarization and CMP Technical Committee, JSPE   Organizing Committee of ICPT2009

  • 2008.04
    -
    Now

    Intelligent Nano-Measure, JSPE