Papers - BABA Akiyoshi
-
MIM Cold Cathode Using Ion-Beam Irradiated Polyimide as Tunneling Insulator Reviewed
Akiyoshi BABA,Tomoya YOSHIDA,Tanemasa ASANO
9th Int. Display Workshops 1049 - 1052 2002.12
-
Micro Field Emitter with Nano-Pillarets Formed by RIE of Photoresist Reviewed
Akiyoshi BABA,Tomoya YOSHIDA,Tanemasa ASANO
2002 International Microprocesses and Nanotechnology Conference 332 - 333 2002.11
-
Field Electron Emission from Gated Organic Emitter Tips Prepared Using Stamping Technique Reviewed
Akiyoshi BABA,Kouichi TSUBAKI,Tanemasa ASANO
15th International Vacuum Microelectronics Conference & 48th International Field Emission Symposium 2002.07
-
Easy Release of the Mold in an Imprinting Method Using Ion Beam Modification of Photoresist Surface Reviewed
Akiyoshi Baba,Masakazu Iwamoto,Kouichi Tsubaki,Tanemasa Asano
Jpn. J. Appl. Phys. 41 ( 6B ) 4190 - 4193 2002.06
-
RIEにより作製した有機物針状突起群を電子源とする三極素子の作製
吉田知也,馬場昭好,浅野種正
信学技報 Technical Report of IEICE 23 - 28 2002.04
-
Easy Removal of Mold for Imprint Lithography by Ion Beam Modification of Photoresist Surface Reviewed
Akiyoshi BABA,Masakazu IWAMOTO,Kouichi TSUBAKI,Tanemasa ASANO
2001 International Microprocesses and Nanotechnology Conference 96 - 97 2001.11
-
Field Emission from Nano-Protrusion Fabricated Using Nano-Stamp Technique Reviewed
Akiyoshi BABA,Kouichi TSUBAKI,Tanemasa ASANO
2001 International Microprocesses and Nanotechnology Conference 196 - 197 2001.11
-
Field Emission from Nano-Pillarets Prepared by Reactive Ion Etching of Organic Materials Reviewed
Akiyoshi BABA,Tanemasa ASANO
21st Int. Display Research Conference in conjunction with the 8th Int. Display Workshops 1185 - 1188 2001.10
-
Field Emission from Metal-Particle Bound with a Photoresist Reviewed
Akiyoshi BABA,Tanemasa ASANO
14th International Vacuum Microelectronics Conference 235 - 236 2001.08
-
有機材料のスタンプ形成による高密度電子源ティップアレイの作製
椿弘一,馬場昭好,浅野種正
信学技報 Technical Report of IEICE 21 - 26 2001.04
-
Field Emission from Pd Fine-Particle Film Reviewed
Akiyoshi BABA,Tanemasa ASANO
The Seventh International Display Workshops IDW '00 979 - 982 2000.12
-
Fabrication of Gated Field Emitter from Wedge Array Prepared by Stamp Technology Reviewed
Akiyoshi BABA,Kouichi TSUBAKI,Masakazu IWAMOTO,Tanemasa ASANO
2000 International Microprocesses and Nanotechnology Conference 128 - 129 2000.07
-
Imprint Lithography Using Triple-Layer-Resist and its Application to MOSFET Fabrication Reviewed
Hiroyuki NAKAMURA,Akiyoshi BABA,Tanemasa ASANO
2000 International Microprocesses and Nanotechnology Conference 232 - 233 2000.07
-
Stamp Technology for Fabrication of Field Emitter from Organic Material Reviewed
Akiyoshi Baba,Masafumi Hizukuri,Masakazu Iwamoto,Tanemasa Asano
Journal of Vacuum Science and Technology B 18 ( 2 ) 877 - 879 2000.04
-
Imprint lithography Using Triple-Layer-Resist and Its Application to Metal-Oxide-Silicon Field-Effect-Transistor Fabrication Reviewed
Hiroyuki Nakamura,Akiyoshi Baba,Tanemasa Asano
Japanese Journal of Applied Physics Part 1 39 ( 12B ) 7080 - 7080 2000.04
-
絶縁体でバインドされたパラジウム微粒子膜からの電界電子放出
馬場昭好,浅野種正
信学技報 Technical Report of IEICE 25 - 30 2000.04
-
Fabrication of Field Emitters from Organic Materials Using a Stamp Technology Reviewed
Akiyoshi Baba,Masafumi Hizukuri,Masakazu Iwamoto,Tanemasa Asano
The Sixth International Display Workshops 919 - 922 1999.12
-
Fabrication of Carbon-Based Field Emitters Using a Stamp Technology Reviewed
Akiyoshi Baba,Masafumi Hizukuri,Masakazu Iwamoto,Tanemasa Asano
1999 International Microprocesses and Nanotechnology Conference 182 - 183 1999.07
-
Field Emission from an Ion-Beam Modified Polyimide Film Reviewed
Akiyoshi Baba,Katsuya Higa,Tanemasa Asano
Japanese Journal of Applied Physics 38 ( 3A ) L261 - L263 1999.04
-
Field emission from an ion-beam modified polyimide film Reviewed
Akiyoshi Baba,Katsuya Higa,Tanemasa Asano
Japanese Journal of Applied Physics 38 ( 3A ) L261 - L263 1999.04