Conference Prsentations (Oral, Poster) -
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Study on processing technology using magnetic levitation tool by superconducting
Tanaka Yuki, Suzuki Keisuke, Khajornrungruang Panart, Otabe Soji, Nakashima Hidetaka
Proceedings of JSPE Semestrial Meeting
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低屈折率の透明樹脂パッドを用いたCMPにおけるモニタリング技術に関する研究
鬼木 喬玄, 鈴木 恵友, カチョーンルンルアン パナート
精密工学会学術講演会講演論文集
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Study on On-Machine Visualization of Surface Processing Phenomena in Nanoscale:the apparatus development
Khajornrungruang Panart, Shirakawa Hiroaki, Suzuki Keisuke, Sakai Koya
Proceedings of JSPE Semestrial Meeting
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ポリシング前後におけるスラリー中の研磨微粒子径に関する研究
永井 利幸, 八尋 新, カチョーンルンルアン パナート, 鈴木 恵友
精密工学会学術講演会講演論文集
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Study on fine particles observation using Transparency micro-patterned pad during CMP
ONIKI Takahiro, SUZUKI Keisuke, KHAJORNRUNGRUANG Panart
The Proceedings of Mechanical Engineering Congress, Japan
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超伝導バルクを利用した磁気浮上工具による中空加工技術に関する研究
日高 裕, 上原 和晃, カチョーンルンルアン パナート, 小田部 荘司, 鈴木 恵友
精密工学会学術講演会講演論文集
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Imaging of Siver Nanoparticles and Ribbons by Evanescent Wave Scattering
Angshuman Pal
Center for Advanced Materials Processing's Annual Technical Meeting 2015 Clarkson University, NYSTAR
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10106 Study on evaluation method for surface topography of CMP polishing pad based on optical Fourier transform
TAJIRI Takahiro, SUZUKI Keisuke, Khajornrungruang Panart, MATSUO Hisanori
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Observation of the fine particles with the hydroxylated fullerene during CMP
Murakawa Wataru, Oniki Takahiro, Khajornrungruang Panart, Suzuki Keisuke
Proceedings of JSPE Semestrial Meeting
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Study on material removal phenomena during CMP:Behavior of the fine particles using transparency pad
Oniki Takahiro, Suzuki Keisuke, Khajornrungruang Panart
Proceedings of JSPE Semestrial Meeting
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Study on On-Machine Visualization of Surface Processing Phenomena in Nanoscale: the apparatus development
Khajornrungruang Panart, Babu Suryadevara, Kimura Keiichi, Suzuki Keisuke
Proceedings of JSPE Semestrial Meeting
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822 Improvement of tool measurement precision with optical diffraction method by a shaped laser beam
YU Jojima, KEISUKE Suzuki, KHAJORNGRUANG Panart
The Proceedings of Conference of Kyushu Branch
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826 Phenomenon analysis of polishing processing by nanoparticles observation using evanescent light
IMAI Yuta, SUZUKI Keisuke, KHAJORNRUNGRUANG Panart
The Proceedings of Conference of Kyushu Branch
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824 Study on magnetic field assisted machining technology using superconducting grains.
Hidaka Yutaka, Suzuki Keisuke, Soejima Kazuki, Panart Khajornrungruang, Matsuda Masakazu, Otabe Edmund Soji
The Proceedings of Conference of Kyushu Branch
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823 Study on Modeling of CMP Material Removal
YAHIRO Shin, NAGAI Toshiyuki, KHAJORNRUNGRUANG Panart, SUZUKI Keisuke
The Proceedings of Conference of Kyushu Branch
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Gap Measurement Between Substrate and Polishing Pad
Panart Khajornrungruang
the 19th International Symposium on Chemical-Mechanical Planarization Clarkson University and NYSTAR
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C30 Study on the material removal mechanism during chemical mechanical polishing
Nagai Toshiyuki, Yahiro Shin, KHAJORNRUNGRUANG Panart, Suzuki Keisuke
The Proceedings of The Manufacturing & Machine Tool Conference
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Study on polishing methods for the hard-to-work material using unconventional nano carbon particle
Murakawa Wataru, Suzuki Keisuke, Khajornrungruang Panart
Proceedings of JSPE Semestrial Meeting
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Study on material removal mechanism for SiO<sub>2</sub>-CMP
Takano Yuichi, Fukuda Kosuke, Khajornrungruang Panart, Kimura Keiichi, Suzuki Keisuke
Proceedings of JSPE Semestrial Meeting
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C31 Study on the functional fine particles with the fullerenol molecules for sapphire CMP
Murakawa Wataru, Oisi Takahumi, Khajornrungruang Panart, Suzuki Keisuke
The Proceedings of The Manufacturing & Machine Tool Conference