Faculty Profiles - IZUMI Akira

Papers - IZUMI Akira

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Carbon contamination of EUV mask: Film characterization, impact on lithographic performance, and cleaning Reviewed

Nishiyama Y., Anazawa T., Oizumi H., Nishiyama I., Suga O., Abe K., Kagata S., Izumi A.

Proceedings of SPIE - The International Society for Optical Engineering 6921 2008.12

Language：English Publishing type：Research paper (international conference proceedings)

The deposition characteristics of carbon film on EUV mask surface, the impact of carbon deposition on lithography performance, and cleaning of deposited carbon film on EUV mask are studied. The density of the carbon film was found to be nearly half of that of graphite by X-ray reflectivity measurement. The impact of carbon deposition on the lithography performance was simulated by SOLID-EUV. The CD variation by carbon deposition on the mask depends on the deposition profile on the absorber pattern. Intentionally created contaminated masks were treated by a cleaning process using atomic hydrogen. The cleaning efficiency and durability of film materials are discussed.

DOI： 10.1117/12.772412

Scopus

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Evaluation of corrosion resistance of SiCN films deposited by HWCVD using organic liquid materials Reviewed

T.Nakayamada,K.Matsuo,Y.Hayashi,A.Izumi,Y.Kadotani

Thin Solid Films 516 656 - 658 2008.04

Reduction of oxide layer on various metal surfaces by atomic hydrogen Reviewed

A.Izumi,T.Ueno,Y.Miyazaki,H.Oizumi,I.Nishiyama

Thin Solid Films 516 853 - 855 2008.04

Cleaning technology for EUV multilayer mirror using atomic hydrogen generated with hot wire Reviewed

K.Motai,H.Oizumi,S.Miyagaki,I.Nishiyama,A.Izumi,T.Ueno,A.Namiki

Thin Solid Films 516 839 - 843 2008.04

Reduction of oxide layer on various metal surfaces by atomic hydrogen treatment Reviewed

Izumi A., Ueno T., Miyazaki Y., Oizumi H., Nishiyama I.

Thin Solid Films 516 ( 5 ) 853 - 855 2008.01

Authorship：Lead author Language：English Publishing type：Research paper (scientific journal)

The reduction of various metallic oxides was examined. Atomic hydrogen generated on a heated tungsten catalyzer was used for reduction. It was found that Cu, Ru, Nb, Mo, Rh, Pd, Ir and Pt oxides can be reduced by irradiation with atomic hydrogen. The activation energy for oxide removal was examined and it was found that the values were very small, 10- 2 to 10- 4 eV. © 2007 Elsevier B.V. All rights reserved.

DOI： 10.1016/j.tsf.2007.06.094

Scopus

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Formation of highly transparent SiCN films prepared by HWCVD Reviewed

Izumi A., Nakayamada T.

CIMTEC 2008 - Proceedings of the 3rd International Conference on Smart Materials, Structures and Systems - Smart Materials and Micro/Nanosystems 54 223 - 226 2008.01

A novel surface cleaning for copper interconnection using ammonium decomposed species generated by hot wire Reviewed

Izumi A., Ueno T.

Solid State Phenomena 134 307 - 310 2008.01

Atomic hydrogen cleaning of Ru-capped EUV multilayer mirror Reviewed

Motai K., Oizumi H., Miyagaki S., Nishiyama I., Izumi A., Ueno T., Miyazaki Y., Namiki A.

Proceedings of SPIE - The International Society for Optical Engineering 6517 ( PART 1 ) 2007.10

Atomic hydrogen cleaning of surface Ru oxide formed by extreme ultraviolet irradiation of Ru-capped multilayer mirrors in H2O ambience Reviewed

Oizumi H., Izumi A., Motai K., Nishiyama I., Namiki A.

Japanese Journal of Applied Physics, Part 2: Letters 46 ( 25-28 ) 2007.07

Oxidation and reduction of thin Ru films by gas plasma Reviewed

Y. Iwasaki,A. Izumi,H. Tsurumaki,A. Namiki,H. Oizumi,I. Nishiyama

Applied Surface Science 253 8699 - 8704 2007.04

H<inf>2</inf> dilution effect in the Cat-CVD processes of the SiH <inf>4</inf>/NH<inf>3</inf> system Reviewed

Ansari S., Umemoto H., Morimoto T., Yoneyama K., Izumi A., Masuda A., Matsumura H.

Thin Solid Films 501 ( 1-2 ) 31 - 34 2006.04

H2 dilution effect in the Cat-CVD processes of the SiH4/NH3 system Reviewed

S.G. Ansari,Hironobu Umemoto,Takashi Morimoto,Koji Yoneyama,Akira Izumi,Atushi Masuda,Hideki Matsumura

Thin Solid Films 510 31 - 34 2006.04

Ultra thin silicon nitride prepared by direct nitridation using ammonia decomposed species Reviewed

Thin Solid Films 501 157 - 159 2006.04

Deposition of SiCN films using organic liquid materials by HWCVD method Reviewed

Akira Izumi,Koshi Oda

Thin Solid Films 510 195 - 197 2006.04

Reduction of oxide layer on Ru surface by atomic-hydrogen treatment Reviewed

I.. Nishiyama,H. Oizumi,K. Motai,A. Izumi,T. Ueno,H. AKiyama,A. Namiki

J. Vac. Sci. Tecnol. B 23 ( 6 ) 3129 - 3131 2005.12

Reduction of oxide layer on Ru surface by atomic-hydrogen treatment Reviewed

Nishiyama I., Oizumi H., Motai K., Izumi A., Ueno T., Akiyama H., Namiki A.

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures 23 ( 6 ) 3129 - 3131 2005.11

Language：English Publishing type：Research paper (scientific journal)

The reduction of Ru oxide was examined as a way of cleaning the cap layer of multilayer mirrors in extreme ultraviolet lithography (EUVL). Ru deposited on a Si surface was oxidized using electron cyclotron resonance (ECR) O2 plasma, and then treated with atomic hydrogen generated with a hot tungsten wire. An analysis of the surface composition by x-ray photoelectron spectroscopy and Auger electron spectroscopy revealed that atomic hydrogen removed the Ru oxide resulting from the ECR O2 plasma treatment. Additionally, atomic force microscopy observations showed that this treatment caused no increase in the surface roughness of the Ru. This indicates that the surface oxidation of EUVL mirrors is reversible, and can largely be eliminated by using atomic hydrogen and the proper cap layer. © 2005 American Vacuum Society.

DOI： 10.1116/1.2130356

Scopus

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Contamination removal from EUV multilayer using atomic hydrogen generated by heated catalyzer Reviewed

Oizumi H., Yamanashi H., Nishiyama I., Hashimoto K., Ohsono S., Masuda A., Izumi A., Matsumura H.

Progress in Biomedical Optics and Imaging - Proceedings of SPIE 5751 ( II ) 1147 - 1154 2005.09

Language：English Publishing type：Research paper (international conference proceedings)

A rapid, damage-free method of removing carbon contamination from EUV multilayer has been developed that employs atomic hydrogen generated by a heated catalyzer consisting of a W wire. Test samples were prepared by contaminating Mo/Si multilayers with carbon using EB or synchrotron radiation (SR). The insertion of a thermal shield between the catalyzer and a sample prevented radiant heat from the catalyzer from damaging the sample during cleaning. Ex situ XPS measurements and measurements of the thickness of the carbon layer with optical thickness measurement systems showed that the new treatment completely removes carbon from multilayers. The EUV reflectivity of multilayers was measured before and after cleaning to assess any resulting damage. It was found that cleaning changed the reflectivity and the centroid wavelength only marginally, within the measurement error.

DOI： 10.1117/12.601136

Scopus

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A novel Surface Cleaning for Copper Interconnection using Atomic Hydrogen Reviewed

A. Izumi,T. Ueno,A. Tsukinari,A. Takada

ECS Transactions 1 ( 3 ) 327 - 332 2005.04

Improvement of Deposition Rate by Sandblasting of Tungsten Wire in Catalytic Chemical Vapor Deposition Reviewed

Akira Heya,Toshikazu Niki,Masahiro Takano,Yasuo Yonezawa,Toshiharu Minamikawa,Susumu Muroi,Shigehira Minami,Tokuo Ikari,Akira Izumi,Atsushi Masuda,Hironobu Umemoto,Hideki Matsumura

Jpn. J. Appl. Phys. 44 ( 4A ) 1943 - 1944 2005.04

Moisuture-Resistive Properties of SiNx Films Prepared by Catalytic Chemical Vapor Deposition below 100oC for Flexibele Organic Light-Emitting Diode Displays Reviewed

Akira Heya,Toshikazu Niki,Masahiro Takano,Yasuo Yonezawa,Toshiharu Minamikawa,Susumu Muroi,Shigehira Minami,Tokuo Ikari,Akira Izumi,Atsushi Masuda,Hironobu Umemoto,Hideki Matsumura

Jpn. J. Appl. Phys. 44 ( 4A ) 1923 - 1927 2005.04

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Papers - IZUMI Akira