Faculty Profiles - KHAJORNRUNGRUANG, Panart

Papers - KHAJORNRUNGRUANG, Panart

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Study on sonic-Assisted processing method for micro pattern formation on Cu film Reviewed International journal

Yamamoto S., Fukushige Y., Nishizawa H., Khajornrungruang P., Suzuki K.

2024 1st International Conference on Robotics, Engineering, Science, and Technology, RESTCON 2024 55 - 58 2024.01

Study on Direct Optical Observation Method of sub-100 nm Gold Particle Motion after Detaching from a Surface being Cleaned

KHAJORNRUNGRUANG Panart, ARIMA Yu, KUROE Norita, HAMADA Satomi, NISHI Tomoya, WADA Yutaka, HIYAMA Hirokuni

The Proceedings of Conference of Kanto Branch ( The Japan Society of Mechanical Engineers ) 2024.30 ( 0 ) 14C11 2024.01

Authorship：Lead author,　Corresponding author Language：Japanese Publishing type：Research paper (other academic)

In this paper, we report the establishment of a method that utilizes the astigmatism aberration in only dark-field optical microscopy in combined with total internal reflection microscopy. This method enables the continuous observation of the behavior of nano-particles after departing from the evanescent light field, until approximately 2 μm range far from the silica surface.

DOI： 10.1299/jsmekanto.2024.30.14c11

CiNii Research

Other Link： https://www.jstage.jst.go.jp/article/jsmekanto/2024.30/0/2024.30_14C11/_pdf

フラーレンを用いた新規炭素同素体の研磨微粒子に関する研究

鈴木恵友, 井浦寛陽, 竹入淳平, 判谷大輔, 森井将希, 西澤秀明, パナートカチョーンルンルアン

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2023A ( 0 ) 410 - 411 2023.08

Language：Japanese Publishing type：Research paper (other academic)

C60トルエン溶液にダイヤモンド粉末を混合させ紫外線照射を行った。その粒子を水分散したスラリーでダイヤモンド基板を研磨したところ、研磨レートと表面粗さの向上が確認出来た。また、その粒子をTEMで観察したところ、ダイヤモンド表面にC60とは異なる炭素同素体が生成されていることが確認された。

DOI： 10.11522/pscjspe.2023a.0_410

CiNii Research

フラーレン構造体を用いた新規研磨微粒子に関する研究

轟木裕太, 森井将希, 判谷太輔, 鈴木恵友, 西澤秀明, Khajornrungruang Panart, 井浦寛陽

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2023S ( 0 ) 788 - 789 2023.03

Language：Japanese Publishing type：Research paper (other academic)

SiC研磨における新規研磨微粒子の開発を行った。ナノシリカ微粒子上に水酸化フラーレンを吸着させた水酸化フラーレンハイブリッド型高速研磨技術について提案する。ここでは紫外線イオンによるポリマー化の影響についても検討している。

DOI： 10.11522/pscjspe.2023s.0_788

CiNii Research

ダイヤフラムを用いた音波援用加工法に関する研究

山本颯真, 西澤秀明, カチョーンルンルアンパナート, 鈴木恵友

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2023S ( 0 ) 794 - 795 2023.03

Language：Japanese Publishing type：Research paper (other academic)

本研究では、加振器による音波を用いてダイヤフラムとダイヤフラム上の研磨砥粒を振動させることにより、被加工物表面にダイヤフラム上の微細パターンを転写する新規音波加工技術を提案する。現在までに転写性を確認するため、絹パッドを貼付したダイヤフラムを加振させることで、Cuウェーハに絹パッドのパターンが転写することを確認した.

DOI： 10.11522/pscjspe.2023s.0_794

CiNii Research

Observation of fluid field near surface region using Schlieren visualization in evanescent field

Ohta Yuki, Permpatdechakul Thitipat, Goto Daiki, Khajornrungruang Panart

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2023S ( 0 ) 400 - 401 2023.03

Identification of Nano-bubbles from Nano-particles in Fluid Field by Optical Observation

Fujishima Hibiki, Kutomi Shotaro, Goto Daiki, Terayama Yutaka, Khajornrungruang Panart

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2023S ( 0 ) 422 - 423 2023.03

Study on Measurement of Sub-100 nm Particles on Micro-Porous Surfaces by Optical Interferometry

Kutomi Shotaro, Khajornrungruang Panart, Goto Daiki, Ohta Yuki

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2023S ( 0 ) 424 - 425 2023.03

Study on On-Machine Visualization of Surface Processing Phenomena in Nanoscale

Goto Daiki, Khajornrungruang Panart, Blattler Aran, Permpatdechakul Thitipat, Ohta Yuki

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2023S ( 0 ) 374 - 375 2023.03

Real Time Nanoscale Observation in Cleaning Phenomena by Evanescent Field

Arima Yu, Fujishima Hibiki, Terayama Yutaka, Khajornrungruang Panart, Hamada Satomi, Wada Yutaka, Hiyama Hirokuni

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2023S ( 0 ) 786 - 787 2023.03

Authorship：Corresponding author Language：Japanese Publishing type：Research paper (other academic)

Preventing the reattachment of nano-particles on the substrate surface is indispensable in the wafer cleaning process. In this paper, transportability of different sized nano-particles were observed, in the shear flow occurring near the surface region that duplicated cleaning process in lab-scale, by using the evanescent field. Sub-100 nm particles affected less flow effect and smaller inertia were less likely to be transported. In case of low speeds of inertial flow, most sub-100 nm particles still remain near the surface.

DOI： 10.11522/pscjspe.2023s.0_786

CiNii Research

Study on Visualization of Cleaning Phenomena in Nano-scale by Evanescent Field

TERAYAMA Yutaka, KHAJORNRUNGRUANG Panart, SUZUKI Keisuke, FUJISHIMA Hibiki, HAMADA Satomi, WADA Yutaka, HIYAMA Hirokuni

The Proceedings of Conference of Kanto Branch ( The Japan Society of Mechanical Engineers ) 2023.29 ( 0 ) 17D08 2023.01

Authorship：Corresponding author Language：Japanese Publishing type：Research paper (other academic)

We report the instantaneous physical evidence of detachment of residual φ80 nm Au particle due to the cavitation effect approaching during enforcing 1.1 MHz waves, which was clarified by using both of evanescent light field and dark field with duplicated the non-contact cleaning process of the surface to be cleaned.

DOI： 10.1299/jsmekanto.2023.29.17d08

CiNii Research

Other Link： https://www.jstage.jst.go.jp/article/jsmekanto/2023.29/0/2023.29_17D08/_pdf

Highly accurate flow rate measuring device for intravenous drip

Meguro Akira, Uchimura Mamoru, Panart Khajornrungruang, Ito Takahiro, Murakami Sunao

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2022A ( 0 ) 61 - 62 2022.08

Language：Japanese Publishing type：Research paper (other academic)

Flow rate control is essential for safety and time management in intravenous drip therapy. The main control method is to adjust the drop velocity. However, due to the influence of surfactants contained in some drugs, a drop may fall below the specified volume, and therefore, much effort and expense are required to improve the accuracy.In this paper, we report on the use of light to measure the volume of a droplet, and the successful miniaturization of a device and highly accurate flow rate measurement by devising an optical path. It is expected to contribute to the improvement of the performance of drip infusion systems.

DOI： 10.11522/pscjspe.2022a.0_61

CiNii Research

Real Time Nanoscale Cleaning Phenomenon Observation During Enforcing MHz Wave By Evanescent Field Reviewed International journal

Terayama Y., Khajornrungruang P., Suzuki K., Mori R., Hamada S., Wada Y., Hiyama H.

ECS Transactions 108 ( 4 ) 17 - 23 2022.01

Proposal of a novel peeling of nano-particle (PNP) process for localized material removal on a hard material surface by controllable magnetic fields Reviewed

Permpatdechakul T., Khajornrungruang P., Suzuki K., Kutomi S.

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022 279 - 280 2022.01

Absolute longitudinal distance measurement verification of a standard polystyrene nanoparticle near a surface in water by means of multi-wavelength evanescent field Reviewed

Blattler A., Khajornrungruang P., Suzuki K., Baba A., Goto D.

European Society for Precision Engineering and Nanotechnology, Conference Proceedings - 22nd International Conference and Exhibition, EUSPEN 2022 385 - 388 2022.01

Study on Visualization of Cleaning Phenomena in Nano-scale by Evanescent Field

KHAJORNRUNGRUANG Panart, TERAYAMA Yutaka, SUZUKI Keisuke, UTSUMI Haruki, HAMADA Satomi, WADA Yuutaka, HIYAMA Hirokuni

The Proceedings of Conference of Kanto Branch ( The Japan Society of Mechanical Engineers ) 2022.28 ( 0 ) 15H06 2022.01

Authorship：Lead author,　Corresponding author Language：Japanese Publishing type：Research paper (other academic)

Cleaning phenomena in semiconductor manufacturing is about the nanoparticles being removed out from, or re-adhering to, or returning to the wafer surface. However, the residual nanoparticles from polishing slurry on the wafer are usually inspected only before and after cleaning process, not during wet cleaning process. Therefore, these cleaning phenomena mechanism on the surface have not already clearly known. We have been studying these phenomena by visualizing the nanoparticle motion on a surface in nanoscale wet cleaning process that are duplicated in lab-scale. This report focuses on the flow velocity distribution occurring on a surface that was obtained by duplicating the water flow in a micro fluid cell on a silica glass surface. We found that the flow, which is nearer than few micrometers from the surface being cleaned, has less shear flow velocity. Therefore, there should be some external force or energy, such as PVA brush or cavitation from ultrasonic, to remove residue particles in cleaning process.

DOI： 10.1299/jsmekanto.2022.28.15h06

CiNii Research

Other Link： https://www.jstage.jst.go.jp/article/jsmekanto/2022.28/0/2022.28_15H06/_pdf

A novel method for 3d nanoscale tracking of 100 nm polystyrene particles in multi-wavelength evanescent fields microscopy – absolute difference height verification – Invited Reviewed International journal

Blattler A., Khajornrungruang P., Suzuki K., Saenna S.

International Journal of Automation Technology ( Fuji Technology Press Ltd. ) 15 ( 6 ) 831 - 841 2021.11

Authorship：Corresponding author Language：English Publishing type：Research paper (scientific journal)

Total internal reflection is an optical imaging technique for nanoparticle tracking and observation employing the scattered light from an evanescent field near the interface or reference surface. Generally, the nanoparticle behavior is the three-dimensional Brownian motion in an aqueous medium. The motion can be traced by an optical microscopy, but it cannot be traced by an electron microscopy technique. In the three-dimensional nanoparticle moving position, the X and Y positions are parallel to the surface, which can be traced by the general microscopy techniques. However, the height position Z of a nanoparticle perpendicular to the surface could not be traced without the longitudinal scanning method. Here, a novel method is proposed to investigate the 3D position of nanoparticles by applying multi-wavelength evanescent fields microscopy, which has a high spatial resolution in the Z-direction without longitudinal scanning. This paper focuses on the verification of measurement in the Z-direction. A piezoelectric actuator was employed to control the nanoparticle displacement in height Z. Standard polystyrene 100 nm particles were randomly adhered on a spherical tip that connected with the piezoelectric actuator. The spherical tip was essentially made from an optical adhesive (n = 1.348) with a refractive index close to the water for decreasing the unnecessary signal from the tip-self during nanoparticle observation in the water. The proposed method could obtain the multi-wavelength scattering lights from the observed nanoparticles by an 8-bit color camera with higher than 50 frames per second recording to investigate the 3D nanoscale tracking. The X and Y positions of nanoparticles were determined by the centroid of the scattering light intensities. The height Z was determined from the logarithm ratios between the detected scattering light intensities of both wavelengths. The measurement repeatability of the absolute difference in height between nanoparticles could be measured less than ±16 nm by using the proposed method. The penetration height measurability range was approximated at 250 nm from the reference surface.

DOI： 10.20965/ijat.2021.p0831

Scopus

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CiNii Research

Other Link： https://www.scopus.com/inward/record.uri?partnerID=HzOxMe3b&scp=85118859497&origin=inward

Computational analysis of nano abrasive motion on SiC surface

Saenna Soraya, Khajornrungruang Panart, Suzuki Keisuke, Blattler Aran, Permpatdechakul Thitipat

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2021A ( 0 ) 126 - 127 2021.09

Authorship：Corresponding author Language：English Publishing type：Research paper (other academic)

The motion of nano-silica abrasive particle before attaching to the SiC surface being polished was analyzed numerically based on Brownian motion with DLVO theory, and then was compared with the results observed by evanescent light field localized on the SiC surface. We found that, when approximately 100 nm-sized silica particles are moving in close proximity within 100 nm from the SiC substrate surface, the nanoparticles would stay intermittently with slightly oscillating behavior before attaching to the surface.

DOI： 10.11522/pscjspe.2021a.0_126

CiNii Research

Compact and highly accurate flow rate measuring device for intravenous drip

Uchimura Mamoru, Khajornrungruang Panart, Ito Takahiro, Murakami Sunao

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2021A ( 0 ) 383 - 384 2021.09

Study on Nanoscale Observatory in Polishing Phenomena applying Optical Evanescent Field

Permpatdechakul Thitipat, Khajornrungruang Panart, Suzuki Keisuke, Baba Akiyoshi

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2021A ( 0 ) 102 - 103 2021.09

Authorship：Corresponding author Language：English Publishing type：Research paper (other academic)

The nanoscale polishing phenomena between substrate surface, 105 nm-sized SiO2 particles slurry, and polishing pad during CMP process were experimentally observed and evaluated to identify the main factors which effectively polish a 4H-SiC substrate. The nanoscale polishing phenomena were observed in-situ by our developed compact apparatus applied an optical evanescent field. The observation is able to detect the scattering light from either the nano-abrasive particles or the pad asperities when they react to the surface to being polishing. The nanoparticle motion phenomena, which two conditions (i)only nanoparticles (without pad) and (ii)nanoparticles with pad sliding, on 4H-SiC substrate were observed. According to the observed results, the observed scattering light of nanoparticle on 4H-SiC was the ellipse shape compared with the observing on SiO2 substrate. Furthermore, we could observe the particles moved nearer and then adhered on the surface. Less particle’s Brownian motion when the particle moved nearer to the surface. In case of nanoparticle with pad sliding, we could observe only the scattering light of pad sliding because the scattering light intensity of particle is quite lower than pad. Therefore, approached nanoparticle to 4H-SiC surface phenomena might be one possible role to explain higher polishing rate CMP parameter.

DOI： 10.11522/pscjspe.2021a.0_102

CiNii Research

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Papers - KHAJORNRUNGRUANG, Panart