Faculty Profiles - KHAJORNRUNGRUANG, Panart

Papers - KHAJORNRUNGRUANG, Panart

Division display21 - 40 of about 232／ All the affair displays >>

Measurement Accuracy of Tool Edge Position in Evanescent Light Fields on Soft Matter Surfaces

Ogata Koki, Khajornrungruang Panart, Terayama Yutaka, Ohta Yuuki

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2025S ( 0 ) 70 - 71 2025.03

Authorship：Corresponding author Language：Japanese Publishing type：Research paper (other academic)

Methods for measuring approach distances of the microtool edge in evanescent light field on solid material surfaces such as glass and SiC has been established. However, it is necessary to bring the tool edge to several hundred nm from the surface, so tool edges and substrates may be broken because of touching. Accordingly, in order to examine the practicality of evanescent light on soft matter surfaces, we report on evaluating the measurement accuracy of the distance between the silicone surface and the tool edge height-controlled by piezoelectric element in this article.

DOI： 10.11522/pscjspe.2025s.0_70

CiNii Research

Attempt of Sustained Nano-Particle Agglomeration Analysis by Simulation

Yamagata Ryunosuke, Khajornrungruang Panart, Ouchida Shuka

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2025S ( 0 ) 202 - 202 2025.03

Mathematical Modeling of Material Removal Rate in Sapphire CMP using Silica Particle Reviewed International journal

Bun-Athuek N., Khajornrungruang P., Suzuki K., Saivaew N.

Proceedings of the World Congress on Mechanical Chemical and Material Engineering 2025.01

水酸化フラーレンを用いたSiCウェハの高効率研磨に関する研究

森井将希, 鈴木恵友, 西澤秀明, カチョーンルンルアンパナート, 判谷太輔

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2024S ( 0 ) 682 - 683 2024.02

Language：Japanese Publishing type：Research paper (other academic)

SiCは高性能パワー半導体材料として期待されているが、高硬度かつ化学的に安定なため加工が困難である．コロイダルシリカを用いたSiC-CMPには多くの時間を要する．一方，ダイヤモンド砥粒を用いることで高効率な研磨が可能だが，基板表面に多くの欠陥や転移を発生させてしまう．本研究では水酸化フラーレンを用いてシリカとダイヤモンドの効果を高め，高効率研磨と平滑面の両立を試みたので，その結果を報告する．

DOI： 10.11522/pscjspe.2024s.0_682

CiNii Research

Real Time Nanoparticle Observation in Cleaning Phenomena by Evanescent Field

Kuroe Norita, Khajornrungruang Panart, Arima Yu, Hamada Satomi, Wada Yutaka, Hiyama Hirokuni

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2024S ( 0 ) 688 - 689 2024.02

Authorship：Corresponding author Language：Japanese Publishing type：Research paper (other academic)

Preventing the re-deposition of nano-particles on the substrate surface is essential in wafer cleaning. Although 3D measurement of the behavior of nano-particles that have been detached and moved by shear flow generated in the extreme vicinity of the surface (moving position) has been performed, it is necessary to use this method in combination with the dark-field observation method, which was limited to observation of suspended particles in very close proximity with surface-localized light. In this paper, we report on our attempt to utilize defocusing using cylindrical lenses to obtain sufficient longitudinal resolution for shallow and deep position measurement of moving particles.

DOI： 10.11522/pscjspe.2024s.0_688

CiNii Research

Spectral Characteristic Verification of Multi-wavelength Evanescent Light Optical System set up with Pellin-Broca Prism Reviewed

Ouchida Shuka, Goto Daiki, Khajornrungruang Panart

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2024S ( 0 ) 329 - 330 2024.02

Authorship：Corresponding author Language：Japanese Publishing type：Research paper (other academic)

Although it is possible to measure the height of nano-particles near the surface using multi-wavelength evanescent light optical system, conventional optical system can only observe two wavelengths using such as dichroic mirrors. Using an optical system that is not limited to the number of wave-length or certain wavelength, has the advantage of being able to measure height with higher accuracy. In this paper, we propose spectroscopic method of multi-wavelength evanescent light using a Pellin-Broca prism and verify the spectral performance of the prism. This turns out to be approximately 0.25 nm/pixel.

DOI： 10.11522/pscjspe.2024s.0_329

CiNii Research

Study on action forces on nano-particle to flat surface using localized remote magnetic field

Mizutani Kyo, Permpatdechakul Thitipat, Goto Daiki, Khajornrungruang Panart

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2024S ( 0 ) 231 - 232 2024.02

Authorship：Corresponding author Language：Japanese Publishing type：Research paper (other academic)

Although magnetic nanoparticles are currently used as a method for precision polishing, localized processing is difficult due to the possible lack of control over magnetic nanoparticles. Therefore, in this study, the relationship between magnetic flux density and force was investigated by comparing the magnitude of magnetic force required for nanoparticles to attach to the substrate surface by simulation and experiment using a solenoid coil for localized control of magnetic nanoparticles.

DOI： 10.11522/pscjspe.2024s.0_231

CiNii Research

Study on Measurement of Sub-100 nm Particles on Micro-Porous Surfaces by Optical Interferometry

Kutomi Shotaro, Kuroe Norita, Khajornrungruang Panart

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2024S ( 0 ) 327 - 328 2024.02

Authorship：Corresponding author Language：Japanese Publishing type：Research paper (other academic)

The nano-particles on micro-porous surfaces neighboring edges, and on an inside of the pores are difficult to be observed by dark-field microscopy. Because the nano-particles neighboring porous edges scattering light are covered up by considerably high scattering light from their edges. An inclined dark field illumination light is not also able to reach inside pores in wide regions to scatter the light from the nano-particle inside their micro-sized pores. Therefore, we have attempted to observe nano-particles adhered on inside micro porous surfaces by an optical interference. In this paper, we report the detection results of silica nano- particles on the inside of micro-porous surfaces by detecting and evaluating nano-particles on an inclined substrate surface regarded as an inside of porous surface.

DOI： 10.11522/pscjspe.2024s.0_327

CiNii Research

Research on polished particles of novel carbon allotropes using fullerenes (2nd report)

Takeiri Junpei, Suzuki Keisuke, Iura Hiroaki, Hantani Taisuke, Morii Masaki, Nishizawa Hideaki, KHAJORNRUNGRUANG Panart

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2024S ( 0 ) 555 - 556 2024.02

Language：Japanese Publishing type：Research paper (other academic)

For the purpose of high efficiency polishing of diamond substrates, which are hard and fragile materials, we have developed fullerene C60 composite polishing fine particles. As a result of applying the developed fine particles to the polishing of the diamond substrate, it was confirmed that the material removal rate was improved and the surface roughness of the polished surface was reduced. In addition, a carbon allotrope different from fullerene C60 was confirmed in the process of making fine particles. In this talk, we will report on the outline of the developed fine particles and the polishing results.

DOI： 10.11522/pscjspe.2024s.0_555

CiNii Research

Experimental In-Situ Observatory on Brownian Motion Behavior of 105 nm Sized Silica Particles During Chemical Mechanical Polishing of 4H-SiC by an Evanescent Field Reviewed International journal

Permpatdechakul Thitipat, Khajornrungruang Panart, Suzuki Keisuke, Blattler Aran, Inthiam Jiraphan

International Journal of Automation Technology ( Fuji Technology Press Ltd. ) 18 ( 1 ) 47 - 57 2024.01

Authorship：Corresponding author Language：English Publishing type：Research paper (scientific journal)

The experimentally observing optical systems for on-machine measurement have been developed to study on nano-polishing phenomena during the chemical mechanical polishing process, which is a wet process in semiconductor manufacturing. The developed optical system employs an evanescent field to selectively enhance exclusively the observatory of phenomena occurring on the surface being polished, offering a lateral resolving power of approximately 400 nm, in the slurry concentration of up to 5 wt% based on the numerical aperture of the objective lens. In addition, there is also the observability of 105 nm and down to 55 nm-sized silica particles without requiring additive fluorescence agents in or around the nano-particles, even when these particles are moving on surfaces such as silica glass or hard materials (silicon carbide: 4H-SiC). Consequently, the motion behavior of nano-particles disjoining with polishing pad asperity was explored and discussed, in this paper. Experimental results revealed that the polishing pad spatially constrains the movement of particles between the pad and the substrate surface, guiding them toward the surface being polished. During pad sliding, fluidically dragged nano-particles exhibit slower movement than the polishing pad sliding speed while retaining the Brownian motion. Furthermore, 105 nm-sized silica particles did not continuously approach to attach onto the SiC surface; the nano-particles approached in steps with reduced Brownian motion in all directions before attaching. This behavior can be attributed to the effects of van der Waals attraction and electrostatic repulsion forces between the particle and the substrate surfaces.

DOI： 10.20965/ijat.2024.p0047

Scopus

CiNii Research

Other Link： https://ndlsearch.ndl.go.jp/books/R000000004-I033252388

Optical Evanescent Field for Direct Observation of Sub-100nm Particle Motion on Glass Surface Invited Reviewed International journal

Khajornrungruang P., Permpatdechakul T., Suzuki K., Blattler A., Terayama Y., Goto D., Phaisalpanumas P., Bun-Athuek N., Phunopas A.

2024 1st International Conference on Robotics, Engineering, Science, and Technology, RESTCON 2024 50 - 54 2024.01

Study on sonic-Assisted processing method for micro pattern formation on Cu film Reviewed International journal

Yamamoto S., Fukushige Y., Nishizawa H., Khajornrungruang P., Suzuki K.

2024 1st International Conference on Robotics, Engineering, Science, and Technology, RESTCON 2024 55 - 58 2024.01

Study on Direct Optical Observation Method of sub-100 nm Gold Particle Motion after Detaching from a Surface being Cleaned

KHAJORNRUNGRUANG Panart, ARIMA Yu, KUROE Norita, HAMADA Satomi, NISHI Tomoya, WADA Yutaka, HIYAMA Hirokuni

The Proceedings of Conference of Kanto Branch ( The Japan Society of Mechanical Engineers ) 2024.30 ( 0 ) 14C11 2024.01

Authorship：Lead author,　Corresponding author Language：Japanese Publishing type：Research paper (other academic)

In this paper, we report the establishment of a method that utilizes the astigmatism aberration in only dark-field optical microscopy in combined with total internal reflection microscopy. This method enables the continuous observation of the behavior of nano-particles after departing from the evanescent light field, until approximately 2 μm range far from the silica surface.

DOI： 10.1299/jsmekanto.2024.30.14c11

CiNii Research

Other Link： https://www.jstage.jst.go.jp/article/jsmekanto/2024.30/0/2024.30_14C11/_pdf

フラーレンを用いた新規炭素同素体の研磨微粒子に関する研究

鈴木恵友, 井浦寛陽, 竹入淳平, 判谷大輔, 森井将希, 西澤秀明, パナートカチョーンルンルアン

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2023A ( 0 ) 410 - 411 2023.08

Language：Japanese Publishing type：Research paper (other academic)

C60トルエン溶液にダイヤモンド粉末を混合させ紫外線照射を行った。その粒子を水分散したスラリーでダイヤモンド基板を研磨したところ、研磨レートと表面粗さの向上が確認出来た。また、その粒子をTEMで観察したところ、ダイヤモンド表面にC60とは異なる炭素同素体が生成されていることが確認された。

DOI： 10.11522/pscjspe.2023a.0_410

CiNii Research

フラーレン構造体を用いた新規研磨微粒子に関する研究

轟木裕太, 森井将希, 判谷太輔, 鈴木恵友, 西澤秀明, Khajornrungruang Panart, 井浦寛陽

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2023S ( 0 ) 788 - 789 2023.03

Language：Japanese Publishing type：Research paper (other academic)

SiC研磨における新規研磨微粒子の開発を行った。ナノシリカ微粒子上に水酸化フラーレンを吸着させた水酸化フラーレンハイブリッド型高速研磨技術について提案する。ここでは紫外線イオンによるポリマー化の影響についても検討している。

DOI： 10.11522/pscjspe.2023s.0_788

CiNii Research

ダイヤフラムを用いた音波援用加工法に関する研究

山本颯真, 西澤秀明, カチョーンルンルアンパナート, 鈴木恵友

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2023S ( 0 ) 794 - 795 2023.03

Language：Japanese Publishing type：Research paper (other academic)

本研究では、加振器による音波を用いてダイヤフラムとダイヤフラム上の研磨砥粒を振動させることにより、被加工物表面にダイヤフラム上の微細パターンを転写する新規音波加工技術を提案する。現在までに転写性を確認するため、絹パッドを貼付したダイヤフラムを加振させることで、Cuウェーハに絹パッドのパターンが転写することを確認した.

DOI： 10.11522/pscjspe.2023s.0_794

CiNii Research

Observation of fluid field near surface region using Schlieren visualization in evanescent field

Ohta Yuki, Permpatdechakul Thitipat, Goto Daiki, Khajornrungruang Panart

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2023S ( 0 ) 400 - 401 2023.03

Identification of Nano-bubbles from Nano-particles in Fluid Field by Optical Observation

Fujishima Hibiki, Kutomi Shotaro, Goto Daiki, Terayama Yutaka, Khajornrungruang Panart

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2023S ( 0 ) 422 - 423 2023.03

Study on Measurement of Sub-100 nm Particles on Micro-Porous Surfaces by Optical Interferometry

Kutomi Shotaro, Khajornrungruang Panart, Goto Daiki, Ohta Yuki

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2023S ( 0 ) 424 - 425 2023.03

Study on On-Machine Visualization of Surface Processing Phenomena in Nanoscale

Goto Daiki, Khajornrungruang Panart, Blattler Aran, Permpatdechakul Thitipat, Ohta Yuki

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2023S ( 0 ) 374 - 375 2023.03

　 PREV - NEXT 　

<KHAJORNRUNGRUANG, Panart>

Papers - KHAJORNRUNGRUANG, Panart