Faculty Profiles - KHAJORNRUNGRUANG, Panart

Papers - KHAJORNRUNGRUANG, Panart

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Study on fabrication method of low refractive transparent pad by thermal transfer

Kato Yuya, Suzuki Keisuke, Khajornrungruang Panart, Yamaguchi Yuta, Tsai Yueh-Hsun

The Proceedings of The Manufacturing & Machine Tool Conference ( The Japan Society of Mechanical Engineers ) 2018.12 ( 0 ) D06 2018.01

Language：Japanese Publishing type：Research paper (other academic)

Fabrication process of the pad has been developed by imprint method with special zig to control of the thickness and patter and electrode structure. Movement of the fine particle is controlled by electrical field using copper wire electrode inserted in the low refractive index – transparency polishing pad. As results, we can be observe the movement of the diamond particle between the pattern structures under the pad by electrical field using digital microscope.

DOI： 10.1299/jsmemmt.2018.12.d06

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Other Link： https://www.jstage.jst.go.jp/article/jsmemmt/2018.12/0/2018.12_D06/_pdf

Observation of Nano-particle Adhesion and Desorption Phenomenon Near to Silicon Nitride and Oxide Film Surface in an Evanescent Field

TERAYAMA Yutaka, NAKANO Asato, Khajornrungruang Panart, SUZUKI Keisuke, WADA Yutaka, HAMADA Satomi

The Proceedings of Conference of Kanto Branch ( The Japan Society of Mechanical Engineers ) 2018.24 ( 0 ) OS0105 2018.01

Authorship：Corresponding author Language：Japanese Publishing type：Research paper (other academic)

The study on adhesion and desorption mechanism of nanoparticles near to polished wafer surface is necessary to efficiently clean the nano-particles from the wafer in semiconductor manufacturing process. This report proposes an optical method to visualize only the nano-particles moving near to Si3N4 and SiO2 film surfaces by applying an evanescent field. We generated the evanescent field locating in limited range from the film surfaces by reflecting a laser beam at an incident angle larger than critical angle. Adhesion and desorption phenomena of the polystyrene latex standard particles (50±1 nm) and the SiO2 particles (55 nm) moving near to the Si3N4 and SiO2 film surfaces were observed by our developed experimental setup. Furthermore, desorption phenomenon of SiO2 particles (105 nm) with the flow occurred by polyvinyl alcohol (PVA) sponge brush sliding was also demonstrated.

DOI： 10.1299/jsmekanto.2018.24.os0105

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Other Link： https://www.jstage.jst.go.jp/article/jsmekanto/2018.24/0/2018.24_OS0105/_pdf

Study on the nano combined fine particles in the CMP

SAKAI Koya, UEDA Tatsunori, YOSHIMOTO Hiroshi, SUZUKI Keisuke, BUN-ATHUEK NATTHAPHON, KHAJORNRUNGRUANG PANART

The Proceedings of Conference of Kyushu Branch ( The Japan Society of Mechanical Engineers ) 2018.71 ( 0 ) G26 2018.01

Study on hybrid fine particles with nano particles for hard to process materials

UEDA Tatsunori, SAKAI Koya, YOSHIMOTO Hiroshi, BUN-ATHUEK NATTHAPHON, KHAJORNRUNGRUANG PANART, SUZUKI Keisuke

The Proceedings of Conference of Kyushu Branch ( The Japan Society of Mechanical Engineers ) 2018.71 ( 0 ) G25 2018.01

Evaluation Method of the Approach of Nanoparticles-to-Surface in Chemical Mechanical Polishing using Optical Evanescent Field Reviewed International journal

Khajornrungruang Panart

Proc. of ICPT 2018 2018 356 - 360 2018.01

Study on Mechanism of High Material Removal in Sapphire-CMP with Sub-10nm Silica Particles using Evanescent Field Light Reviewed

Khajornrungruang Panart

Proc. of ICPT 2018 2018 76 - 81 2018.01

Analytical on mixed colloidal silica particle in slurry of sapphire chemical mechanical polishing Reviewed

2017.11

Study on effect of the surface variation of colloidal silica abrasive during chemical mechanical polishing of sapphire Reviewed International journal

Bun-Athuek N., Yoshimoto Y., Sakai K., Khajornrungruang P., Suzuki K.

Japanese Journal of Applied Physics 56 ( 7 ) 2017.07

In situ measurement method for film thickness using transparency resin sheet with low refractive index under wet condition on chemical mechanical polishing Reviewed International journal

Oniki T., Khajornrungruang P., Suzuki K.

Japanese Journal of Applied Physics 56 ( 7 ) 2017.07

Micro tool diameter monitoring by means of laser diffraction for on-machine measurement Reviewed International journal

Khajornrungruang P., Kimura K., Suzuki K., Inoue T.

International Journal of Automation Technology 11 ( 5 ) 736 - 741 2017.01

Non-contact Micro Tool Tip Position Detection Method by Evanescent Light Field

Khajornrungruang PANART, INOUE Tomoki, SUZUKI Keisuke

The Proceedings of Mechanical Engineering Congress, Japan ( The Japan Society of Mechanical Engineers ) 2017 ( 0 ) S1330103 2017.01

Authorship：Lead author,　Corresponding author Language：Japanese Publishing type：Research paper (other academic)

Non-contact tool setter for rotating micro tools has been needed because the position of tool tip during rotation is different from the position when the tool is not rotating. Furthermore, precision of tool position measurement is definitely required in nanoscale due to the miniaturization of micro rotating tool size down to smaller than 50μm. An evanescent light field is applied to detect a micro tool tip position in nanoscale without contacting between micro tool and detector. In this report, micro tools with diameter of φ 50μm were approached to and/or departed from a glass reference plane surface by a nano-controled piezo actuator to verify our detection method. Consequently, the tool tips were detected in the evanescent field during 300 nm range from the reference surface, implying that the tool tip can be detected in the precision of less than ±150 nm by only observing the scattering light from the evanescent light field without contacting.

DOI： 10.1299/jsmemecj.2017.s1330103

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Other Link： https://www.jstage.jst.go.jp/article/jsmemecj/2017/0/2017_S1330103/_pdf

Study on processing technology using magnetic levitation tool by superconducting

Tanaka Yuki, Suzuki Keisuke, Khajornrungruang Panart, Otabe Soji, Nakashima Hidetaka

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2017A ( 0 ) 765 - 766 2017.01

Study on processing technology using magnetic levitation tool by superconducting

TANAKA Yuki, SUZUKI Keisuke, Khajornrungruang P

The Proceedings of Conference of Kyushu Branch ( The Japan Society of Mechanical Engineers ) 2017.70 ( 0 ) 907 2017.01

低屈折率の透明樹脂パッドを用いたCMPにおけるモニタリング技術に関する研究

鬼木喬玄, 鈴木恵友, カチョーンルンルアンパナート

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2017S ( 0 ) 523 - 524 2017.01

Authorship：Last author Language：Japanese Publishing type：Research paper (other academic)

水と同等の屈折率を有する透明な樹脂パッドを用いて、スラリー中の微粒子観察やシリコン酸化膜の膜測など、CMPにおけるモニタリング技術に関する研究を行っている。今回は低屈折率の透明樹脂パッドを用いたモニタリング技術のコンセプトと、その足がかりとなる実験データについて報告する。

DOI： 10.11522/pscjspe.2017s.0_523

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ナノスケールにおける加工現象可視化に関する研究 Reviewed

白川裕晃, カチョーンルンルアンパナート, 鈴木恵友

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2017A ( 0 ) 985 - 986 2017.01

Authorship：Corresponding author Language：Japanese Publishing type：Research paper (other academic)

ナノスケールにおける加工現象として，ナノ粒子を用いたポリシング加工がある．本研究は，ポリシング加工のナノ粒子の挙動を観察し，ナノ粒子による加工現象を解明することを目的とする．そこで本研究では，表面上近傍に局在するエバネッセント光を用いた実時間観測を行っている．既知のナノ単粒子に多波長エバネッセント光を当て，その散乱光の強度を調べたので，ここに報告する．

DOI： 10.11522/pscjspe.2017a.0_985

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Study on evaluation method for surface topography of polishing pad based on optical Fourier transform Reviewed International journal

Suzuki K., Tajiri T., Khajornrungruang P., Mochizuki Y., Hiyama H., Matsuo H.

2015 International Conference on Planarization/CMP Technology, ICPT 2015 2016.02

I-11 サファイアCMPにおけるコロイダルシリカと水酸化フラーレンの混合スラリーの最適化

BUN-ATHUEK NATTHAPHON, KHAJORNRUNGRUAN PANART, MURAKAWA WATARU, SATOU TOKIHITO, SUZUKI KEISUKE

日本機械学会九州支部講演論文集 2016 ( 0 ) 361 - 362 2016.01

Study on fine particles observation using Transparency micro-patterned pad during CMP

ONIKI Takahiro, SUZUKI Keisuke, KHAJORNRUNGRUANG Panart

The Proceedings of Mechanical Engineering Congress, Japan ( The Japan Society of Mechanical Engineers ) 2016 ( 0 ) S1330203 2016.01

Authorship：Last author Language：Japanese Publishing type：Research paper (other academic)

Transparency micro-patterned pad is used to observe fine particles by an epi-illumination microscope. The material of transparency micro-patterned pad is resin which has almost same as the refractive index of water. Therefore, it has characteristic that the micro pattern could disappear in the observation image by filling water. Epi-illumination microscope has illumination system and the detection system on the same side. In this study, we succeeded to observe the diamond particles with a diameter of 1μm on the glass substrate at 1000 frame/s in dark-field illumination. This results show that the fine particles could be observed simplicity, and also suggest the possibility that the fine particles observation on opaque substrate using the epi-illumination microscope.

DOI： 10.1299/jsmemecj.2016.s1330203

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Other Link： https://www.jstage.jst.go.jp/article/jsmemecj/2016/0/2016_S1330203/_pdf

超伝導バルクを利用した磁気浮上工具による中空加工技術に関する研究

日高裕, 上原和晃, カチョーンルンルアンパナート, 小田部荘司, 鈴木恵友

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2016S ( 0 ) 971 - 972 2016.01

Language：Japanese Publishing type：Research paper (other academic)

本研究では超電導現象である磁気浮上を利用し、金型や3Dプリンタなどの中空部品成形技術が抱える問題を解消する新規中空加工技術の確立を目指している。その概要としては、磁気浮上を利用して磁性体や超伝導体を一定間隔離して浮上させトラップし、さらに回転運動を加え回転工具とすることで被加工物を切削する技術である。本報では樹脂などを用いて本加工技術の原理検証を行ったので、その内容について報告する。

DOI： 10.11522/pscjspe.2016s.0_971

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ポリシング前後におけるスラリー中の研磨微粒子径に関する研究

永井利幸, 八尋新, カチョーンルンルアンパナート, 鈴木恵友

精密工学会学術講演会講演論文集 ( 公益社団法人精密工学会 ) 2016S ( 0 ) 371 - 372 2016.01

Authorship：Last author Language：Japanese Publishing type：Research paper (other academic)

CMPでは，複数の加工材料に対して最適なスラリーやポリシングパッドを適用させる必要がある．これらの部材を最適化するためには，材料除去メカニズムに基づき，スラリー中微粒子の種類や微粒子径，材質，薬液を選定することが重要である．そこで本研究では，サファイア，SiO2などの複数の基板に対して動的光散乱法（DLS）を用いて微粒子径の変化について評価したので報告する．

DOI： 10.11522/pscjspe.2016s.0_371

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Papers - KHAJORNRUNGRUANG, Panart