Papers - KHAJORNRUNGRUANG, Panart
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「寄書」見えない可視光
カチョーンルンルアン パナート
Voice of CMP, No. 25 ( 精密工学会 プラナリゼーションCMPとその応用技術専門委員会 ) 2013.12
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Nano-Sized Particles Detection and Analysis in Solutions using Evanescent Field Invited
2013.09
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Study on fine particles behavior in slurry flow between wafer and polishing pad as a material removal process in CMP Invited Reviewed
345 - 350 2013.01
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高速加工における小径工具の高精度オンマシン計測
カチョーンルンルアン パナート、木村景一、鈴木裕
機械技術 ( 日刊工業新聞社 ) 60 ( 7 ) 38 - 41 2012.07
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Micro Tool Cutting Edge Profile Measurement using Laser Diffraction Method
Die and Mould Technology 27 ( 7 ) 124 2012.07
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On-machine measurement of a distance between high speed rotation tool tip and workpiece by laser diffraction Reviewed
Panart Khajornrungruang, Keiichi Kimura, Keisuke Suzuki
251 - 254 2012.06
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High precision tool cutting edge monitoring using laser diffraction for on-machine measurement Invited Reviewed International journal
Khajornrungruang P., Kimura K., Takaya Y., Suzuki K.
International Journal of Automation Technology 6 ( 2 ) 163 - 167 2012.03
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High Precision Tool Cutting Edge Monitoring Using Laser Diffraction for On-Machine Measurement Reviewed
Panart Khajornrungruang, Keiichi Kimura, Yasuhiro Takaya, Keisuke Suzuki
International Journal of Automation Technology 6 ( 2 ) 163 - 167 2012.03
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On-machine measurement of a distance between high speed rotation tool tip and workpiece by laser diffraction Reviewed
1 251 - 254 2012.01
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Study on fine particle behavior in slurry flow between wafer and polishing pad as a material removal process in CMP Invited Reviewed
Kimura K., Suzuki K., Khajornrungruang P.
ICPT 2012 - International Conference on Planarization/CMP Technology, Proceedings 345 - 350 2012.01
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Study on Sapphire CMP Slurry using Water-soluble Fullerenol as Fine Particles Reviewed
Keiichi Kimura,Panart Khajornrungruang,Eiichiro Okamoto
Proc of International Conference on Planarization/CMP Technology 287 - 292 2011.11
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Spatial Fourier Transform Analysis of Polishing Pad Surface Topography Reviewed
2011.09
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Performance of water-soluble fullerene as novel functional fine particles for sapphire CMP Reviewed
2011.09
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Slurry Supplying Method for Large Quartz Glass Substrate Polishing Reviewed
Panart Khajornrungruang,Keiichi Kimura,Ryuji Yui,Nagisa Wada,Keisuke Suzuki
Japanese Journals of Applied Physics 50 ( 5 ) 2011.05
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Investigation on slurry flow and temperature in polishing process of quartz glass substrate Invited Reviewed International journal
Khajornrungruang P., Wada N., Kimura K., Yui R., Suzuki K.
International Journal of Automation Technology 5 ( 2 ) 195 - 200 2011.03
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Evaluation method applying Fourier transform analysis for conditioned polishing pad surface topography Invited Reviewed International journal
Kimura K., Khajornrungruang P., Okuzono T., Suzuki K.
International Journal of Automation Technology 5 ( 2 ) 173 - 178 2011.03
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Evaluation Method Applying Fourier Transform Analysis for Conditioned Polishing Pad Surface Topography Reviewed
Keiichi Kimura,Panart Khajornrungruang,Takahisa Okuzono,Keisuke Suzuki
International Journal of Automation Technology 5 ( 2 ) 173 - 178 2011.03
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Investigation on Slurry Flow and Temperature in Polishing Process of Quartz Glass Substrate Reviewed
Panart Khajornrungruang,Nagisa Wada,Keiichi Kimura,Ryuji Yui,Keisuke Suzuki
International Journal of Automation Technology 5 ( 2 ) 195 - 200 2011.03
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Study on Sapphire Chemical Mechanical Polishing using mixed abrasive slurry with fullerenol Reviewed
294 - 295 2010.12
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Investigation on slurry flow and temperature in polishing process of quartz glass substrate Reviewed
559 - 562 2010.12