Faculty Profiles - KHAJORNRUNGRUANG, Panart

Papers - KHAJORNRUNGRUANG, Panart

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Study on material removal mechanism for Cu-CMP on a patterned silicon wafer

Bakier M.A.Y.A., Matsumoto R., Fuchiwaki M., Khajornrungruang P., Suzuki K.

10th International Conference on Leading Edge Manufacturing Technologies in 21st Century, LEM 2021 243 - 245 2021.01

Brownian motion simulation of SiO<inf>2</inf> abrasive nanoparticle on SiC substrate surface Reviewed

Saenna S., Khajornrungruang P., Blattler A., Permpatdechakul T., Suzuki K., Bakier M.A.

10th International Conference on Leading Edge Manufacturing Technologies in 21st Century, LEM 2021 353 - 357 2021.01

Investigation on the Abrasive Phenomenon of Colloidal SiO2 Particles and Water-soluble C60 Inclusion Complex Particles in the CMP Process of the 4H-SiC Substrate Wafer Reviewed International journal

Tsai Yueh-Hsun, Suzuki Keisuke, Chen Chao-Chang A., Khajornrnrungruang Panart

Proceedings of International Conference on Leading Edge Manufacturing in 21st century : LEM21 ( The Japan Society of Mechanical Engineers ) 2021.10 ( 0 ) 094-114 2021.01

Language：English Publishing type：Research paper (international conference proceedings)

This study used a water-soluble inclusion complex, fullerene/β-cyclodextrins(C60/β-CDs), as additive abrasive with conventional SiO2 slurry for the chemical mechanical polishing/planarization(CMP) of the silicon carbide substrate wafer. The hydrodynamic size(dH) of C60/β-CDs suspension was measured by the dynamic light scattering(DLS) method; the appearance of a C60/β-CDs inclusion complex is observed by TEM. The C60/β-CDs hybrid SiO2-based slurry performed a higher removal rate than conventional SiO2 slurry, and the polished surface showed a lower depression and roughness, too.

DOI： 10.1299/jsmelem.2021.10.094-114

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Other Link： https://www.jstage.jst.go.jp/article/jsmelem/2021.10/0/2021.10_094-114/_pdf

Study on Polishing Method Using Double Magnet System by Superconductive Assisted Machining Method Reviewed International journal

Keisuke Suzuki, Tatsuya Nakasaki, Hidetaka Nakashima, Panart Kajornrunruan, Misaki Onomata, Yushi Kinoshita, Ruizhe Zhang, Edmund Soji Otabe

JSME 2020 Conference on Leading Edge Manufacturing/Materials and Processing 2020.09

High-speed three-dimensional tracking of individual 100 nm polystyrene standard particles in multi-wavelength evanescent fields Invited Reviewed

Aran Blattler, Panart Khajornrungruang, Keisuke Suzuki, Thitipat Permpatdechakul

Measurement Science and Technology 31 ( 9 ) 2020.09

Advanced chemical-mechanical planarization for 4H-SiC substrate by water-soluble inclusion complexes of fullerene Reviewed International journal

Tsai Y.H., Chen C.C.A., Suzuki K., Khajornrungruang P., Chiu S.F., Hua C.T.

Japanese Journal of Applied Physics 59 ( SL ) 2020.07

Trajectories, diffusion, and interactions of single ceria particles on a glass surface observed by evanescent wave microscopy Reviewed

Seo J., Gowda A., Khajornrungruang P., Hamada S., Song T., Babu S.

Journal of Materials Research 35 ( 3 ) 321 - 331 2020.02

Study on novel nano fine particles reacted with fullerene for hard to process material

Hisayoshi Fuya, Suzuki Keisuke, Tsai Yueh-Hsun, Khajornrungruang Panart, Yasunaga Takuo, Takazaki Hiroko, Ouchi Masayoshi

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2020 ( 0 ) 486 - 487 2020.01

局在光によるナノ研磨現象観測に関する研究:第1報:開発した小型装置による実験的評価

パームパッデーチャークンティティパット, カチョーンルンルアンパナート, 鈴木恵友, ブラットラーアラン, 寺山裕

精密工学会学術講演会講演論文集 ( The Japan Society for Precision Engineering ) 2020 ( 0 ) 658 - 659 2020.01

Authorship：Corresponding author Language：English Publishing type：Research paper (other academic)

The nanoscale polishing phenomena between the substrate surface and polishing pad during process, such as CMP process, were observed and evaluated, in this report. The concept of observation method is applied the generated evanescent field to limit the observable region only on the surface being polished, and the detectable scattering light from the nanoparticles and polishing pad when they move close to the surface in a range of evanescent field. The detected scattering light intensity could be used for evaluating the phenomena. According to the observed results, there should have been more than two different phenomena in polishing; the particles adhering on the polishing pad, and the individual movement particles during moving. However, the phenomena being able to perform polishing, could not clearly identify yet.

DOI： 10.11522/pscjspe.2020S.0_658

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Other Link： https://ci.nii.ac.jp/naid/130007896847

作用表面上におけるナノスケール現象の化学的実時間観測に関する研究:第1報:ラマン分光光度計の開発

ドバンタン, カチョーンルンルアンパナート, 鈴木恵友

精密工学会学術講演会講演論文集 ( The Japan Society for Precision Engineering ) 2020 ( 0 ) 622 - 623 2020.01

Authorship：Corresponding author Language：English Publishing type：Research paper (other academic)

This paper reports development of an optical apparatus for Real-time observation during chemical reactions in Nano-scale process on surface such as CMP (Chemical-Mechanical polishing) and catalysis by applying in evanescent field. Beside using evanescent field to observe Nano-particles in physical aspects, the developed Raman spectroscopy apparatus aims to observe chemical aspects during reactions on processing surface. Changes in Raman scattering spectrum is expected to understand chemical reactions on the processing surface. In this report, the 532 nm wavelength laser source will be used to generate evanescent field. A rotation stage of diffraction grating and a translation stage will used to optimize the Raman spectrum data.

DOI： 10.11522/pscjspe.2020S.0_622

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CiNii Research

Other Link： https://ci.nii.ac.jp/naid/130007896772

ナノスケールにおける加工現象可視化に関する研究:第6報:単一ナノ粒子の三次元目変位の検証

ブラットラーアラン, カチョーンルンルアンパナート, 鈴木恵友, パームパッデーチャークンティティパット

精密工学会学術講演会講演論文集 ( The Japan Society for Precision Engineering ) 2020 ( 0 ) 588 - 589 2020.01

Authorship：Corresponding author Language：English Publishing type：Research paper (other academic)

The nanoscale phenomena, such as chemical mechanical polishing (CMP) process, present near the surface. A three-dimensional nanoparticle tracking could explain the phenomena that happen in the polishing process. From our previous report, we have investigated the three-dimensional motion of an individual standard nanoparticle by using optical method, but the height Z on the third dimension was not accurately verified. In this report, the sub-100 nm individual nanoparticles were fixed on the tip which the tip was connected to the piezo actuator for controlling the height Z displacement. The multi-wavelength evanescent fields with optical microscopy system is also applied in the experiment for three-dimensional nanoparticle tracking. The scattering light from nanoparticle will exponentially increase when the nanoparticle on the tip was downward moved close to the reference surface. Finally, The height Z uncertainty could be measured approximately ±25 nm and the penetration height measurability were 200 nm far from the reference surface. We could three-dimensionally track the individual standard nanoparticle in recording speed higher than 50 frames per second for exposure time less than 10 milliseconds.

DOI： 10.11522/pscjspe.2020S.0_588

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CiNii Research

Other Link： https://ci.nii.ac.jp/naid/130007896683

Study on Visualization of Cleaning Phenomena in Nano-scale by Evanescent Field

KHAJORNRUNGRUANG Panart, TERAYAMA Yutaka, SUZUKI Keisuke, HAMADA Satomi, WADA Yuutaka, HIYAMA HIYAMA

The Proceedings of Conference of Kanto Branch ( The Japan Society of Mechanical Engineers ) 2020 ( 0 ) 17E02 2020.01

Authorship：Lead author Language：Japanese Publishing type：Research paper (other academic)

Cleaning phenomena in semiconductor manufacturing is about the nano-contamination being repelled out from, or adhering to, the wafer surface. However, residual contamination on the wafer has been usually inspected only before and after cleaning process, not during wet cleaning process. Therefore, these cleaning phenomena mechanism on the surface have not already clearly known. We have been establishing dynamically visualization of wet cleaning phenomena on the surface applying localized light called evanescent light generated by internal reflection. This article introduces some of observed physical phenomena during duplicated cleaning process in both contact cleaning by a PVA brush and non-contact cleaning by mega-sonic wave.

DOI： 10.1299/jsmekanto.2020.17E02

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CiNii Research

Other Link： https://ci.nii.ac.jp/naid/130007994424

Real Time Nanoscale Observation in Cleaning Phenomena by Evanescent Field:2nd report : Non-contact Removal of Abrasive Nano-particles during Enforcing Mega sonic

Terayama Yutaka, Khajornrungruang Panart, Suzuki Keisuke, Permpatdechakul Thitipat, Hamada Satomi, Wada Yutaka, Hiyama Hirokuni

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2020 ( 0 ) 660 - 661 2020.01

Three-dimensional tracking and height verification of polystyrene particles with piezo actuator positioning by means of multi-wavelength evanescent fields Reviewed

Blattler A., Khajornrungruang P., Suzuki K., Permpatdechakul T.

Proceedings of the 20th International Conference of the European Society for Precision Engineering and Nanotechnology, EUSPEN 2020 53 - 56 2020.01

3D trajectories and diffusion of single ceria particles near a glass surface and their removal Reviewed

Seo J., Gowda A., Khajornrungruang P., Hamada S., Babu S.V.

Journal of Materials Research 2020.01

Hydropower plant generator system model using labVIEW Reviewed International journal

Tammaruckwattana S., Reangkittakarn S., Khajornrungruang P., Phaisalpanumas P., Rerkratn A.

Proceeding - 5th International Conference on Engineering, Applied Sciences and Technology, ICEAST 2019 2019.07

Study on Relationship of the Material Removal Amount and the Increase in Abrasive Nanoparticle Size during Si-CMP Reviewed International journal

Boripatkosol S., Bun-Athuek N., Khajornrungruang P., Suzuki K., Chanthawong N., Phaisalpanumas P.

ESIT 2018 - 3rd International Conference on Engineering Science and Innovative Technology, Proceedings 2019.03

Real Time Nanoscale Observation in Cleaning Phenomena by Evanescent Field Reviewed

Terayama Yutaka, Kusatsu Kohei, Morita Rintaro, Khajornrungruang Panart, Wada Yutaka, Hamada Satomi, Hiyama Hirokuni

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2019S ( 0 ) 138 - 139 2019.03

Characteristic Evaluation of Scattering Light from Cutting edge in Evanescent Field by Using Numerical Simulation Method

Aramaki Hirochika, Khajornrungruang Panart, Suzuki Keisuke, Taira Kanako

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2019S ( 0 ) 904 - 905 2019.03

Study on On-Machine Visualization of Surface Processing Phenomena in Nanoscale

Blattler Aran, Khajornrungruang Panart, Suzuki Keisuke, Permpatdechakul Thitipat

Proceedings of JSPE Semestrial Meeting ( The Japan Society for Precision Engineering ) 2019S ( 0 ) 459 - 460 2019.03

Authorship：Corresponding author Language：English Publishing type：Research paper (other academic)

The nanoparticle is popularly used for chemical mechanical polishing process (CMP) in semiconductor industry. There are many unknown phenomena in nanoparticles moving during polishing process. Therefore, we have been studying the phenomena by using optical method on 3D position tracking of nanoparticle in real-time measurement. In this report, the gold 50 nm standard particles would be observed to determine the 3D motion tracking of individual nanoparticle. According to our previous studies, the single wavelength of evanescent light field is hard to determine the 3D spatial position of each nanoparticle. Thus, the multi-wavelength of scattering light is applied in the experiment. The scattering light will occur when the particle moving near to the reference surface. Finally, the 3D position tracking results of standard nanoparticle will be investigated and discussed by the exponential relationships between the detected scattering light and the measured depth Z values.

DOI： 10.11522/pscjspe.2019s.0_459

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Papers - KHAJORNRUNGRUANG, Panart